Method for making composite substrate of microstrip gas-compartment detector

The technology of a composite substrate and manufacturing method, which is applied in the field of manufacturing composite substrates of microstrip gas chamber detectors, can solve problems such as difficult to obtain S8900 glass, reduce multi-level scattering, etc., achieve excellent physical and chemical stability, improve stability, Effect of High Gas Gain

Inactive Publication Date: 2004-12-29
SHANGHAI UNIV
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Problems solved by technology

People have found a very stable glass substrate called Schott S8900, which is an electronically conductive semiconductor glass with suitable resistivity, but in order to reduce multi-level scattering, the thickness of the substrate should not be greater than a few hundred μm, but it is difficult to obtain such Thin S8900 Glass

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  • Method for making composite substrate of microstrip gas-compartment detector
  • Method for making composite substrate of microstrip gas-compartment detector

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Embodiment 1

[0024] Use optical glass D263 with a thickness of 0.5mm and an area of ​​2cm×2cm as the substrate, and ultrasonically clean it in acetone and deionized water for 10 minutes in sequence. After drying, the substrate was placed into a radio frequency plasma-assisted chemical vapor deposition device (such as figure 1 ) on the cathode graphite target 7 in the vacuum reaction chamber 9, the radio frequency frequency is 13.56 MHz, and high-purity (99.99%) methane gas and high-purity (99.998%) argon gas are used as reactants. The flow of the two gases is controlled by their respective flow meters and mixed before entering the reaction chamber. The flow rate of the argon branch is controlled at 60ml / min, and the flow rate of methane is 30ml / min. A vacuum pump+molecular pump air extraction system 15 and a pressure reducing valve 14 are connected below the reaction chamber 9, which can carry out high vacuum and decompression, and maintain the stability of the air pressure in the reaction...

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Abstract

The process of making composite substrate for micro stripe gas chamber detector is one RF plasma aided chemically vapor deposition process to deposit diamond-like film onto D263 glass. Optical glass D263 via pre-treatment is first deposited inside high vacuum reaction chamber and then annealed in a nitrogen atmosphere furnace to produce composite substrate. By means of applying bios, increasing magnetic field and annealing treatment, the present invention obtain high quality composite diamond-like/D263 glass substrate. The present invention overcomes the stress between the film and the substrate, lower combining force and other problems, and has less detector charge accumulating effect and high substrate stability.

Description

technical field [0001] The invention relates to a method for manufacturing a microstrip gas chamber (MSGC) detector compound substrate, which is made by depositing a diamond-like carbon (DLC) film on D263 glass. It belongs to the field of thin film vapor deposition technology, detectors, high energy physics and nuclear physics. Background technique [0002] In 1988, A.Oed proposed a new type of position sensitive detector - Microstrip Gas Chamber (MSGC) based on the multi-wire proportional chamber. Due to the small electrode strip width and spacing, and good uniformity, the positive The ion collection time is very short, which can meet the requirements of working at a high count rate, and shows the advantages of high spatial resolution and time resolution. Candidates for track detectors, and are being developed for X-ray imaging detectors. Although the microstrip gas chamber has shown excellent performance, some problems have been found in the research, mainly the positive...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/22
Inventor 夏义本王林军张明龙杨莹汪琳
Owner SHANGHAI UNIV
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