Method for preparing large-area and height ordered nanometer silica quantum dot array
A nano-silicon quantum dot, highly ordered technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as difficult quantum confinement effects and difficult quantum confinement effects
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[0013] The first is to prepare the alumina template. After cleaning the high-purity (99.999%) aluminum sheet with acetone, an electrochemical corrosion is performed. The corrosion condition is 0.3 mol / liter oxalic acid electrolyte, the voltage is 40 volts, the temperature is 10 ° C, and the corrosion time for one time is For 2 hours, soak the sample after the primary corrosion in a mixture of 6.0% by weight phosphoric acid and 1.8% by weight chromic acid at a temperature of 60°C for 4 hours, wash it with deionized water, and perform secondary corrosion. The conditions are the same as the first corrosion, but the corrosion time is shortened to 2.5 minutes to 5 minutes, so that ultra-thin alumina templates with different thicknesses can be obtained. The prepared templates present a highly ordered hexagonal structure with a thickness of 150 nanometers to 300 nanometers. The diameter of...
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