Method for preparing large-area and height ordered nanometer silica quantum dot array

A nano-silicon quantum dot, highly ordered technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as difficult quantum confinement effects and difficult quantum confinement effects

Inactive Publication Date: 2005-05-11
SHANGHAI JIAO TONG UNIV
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Problems solved by technology

However, there is a common problem in these artificial quantum dots prepared by alumina template technology, that is, the diameter of artificial quantum dots is greater than 20 nanometers, which is not a real quantum system, and it is difficult for quantum confinement effects to occur, because there is a critical size for quantum effects. When the size of the quantum dot is larger than the critical size, it is difficult for the quantum confinement effect to occur, and the critical size of the semiconductor material is generally very small, only a few nanometers, such as silicon is only 4 nanometers

Method used

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Examples

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Embodiment Construction

[0012] Further illustrate content of the present invention below in conjunction with example:

[0013] The first is to prepare the alumina template. After cleaning the high-purity (99.999%) aluminum sheet with acetone, an electrochemical corrosion is performed. The corrosion condition is 0.3 mol / liter oxalic acid electrolyte, the voltage is 40 volts, the temperature is 10 ° C, and the corrosion time for one time is For 2 hours, soak the sample after the primary corrosion in a mixture of 6.0% by weight phosphoric acid and 1.8% by weight chromic acid at a temperature of 60°C for 4 hours, wash it with deionized water, and perform secondary corrosion. The conditions are the same as the first corrosion, but the corrosion time is shortened to 2.5 minutes to 5 minutes, so that ultra-thin alumina templates with different thicknesses can be obtained. The prepared templates present a highly ordered hexagonal structure with a thickness of 150 nanometers to 300 nanometers. The diameter of...

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Abstract

The method includes following steps: firstly alumina molding board is made by using electrochemical method;the molding board with highly ordered pore space structure is transplanted to semiconductor base plat; the natural quantum dot of nano-silicon is grown on the semiconductor base plate through the pore of the molding board by using PECVD; finally the aluminum molding board will be removed by using wet chemical method. The artificial quantum dot obtained by the invention has following features: average diameter is 30-50 nanometers; height is 20-30 nanometers; separation is 100 nanometers; area density is over 1X1010 /cm2;a plenty of silica natural quantum dots whose diameter are from 3-6 nanometers are embedded into each artificial quantum dot.

Description

technical field [0001] The invention relates to a method for preparing a semiconductor quantum dot array, in particular a method for preparing a large-area, highly ordered nano-silicon quantum dot array, which is used in the field of semiconductor material preparation. Background technique [0002] Quantum dots, especially semiconductor quantum dots, are expected to be applied in single-electron transistors, high-density memories, semiconductor lasers, and tunnel diodes due to the quantum confinement effect, and quantum dot devices have the advantages of small size, high efficiency, and low energy consumption. . The commonly used ways to grow quantum dots mainly include Stranski-Kranstanov (S-K) growth method and photolithography technology, but both methods require expensive equipment. The S-K growth method must meet the lattice mismatch and the obtained quantum dots have uneven size distribution and irregular arrangement, which greatly limits the preparation and applicati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00
Inventor 沈文忠丁古巧郑茂俊徐维丽
Owner SHANGHAI JIAO TONG UNIV
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