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Selected acid generating agents and their use in processes for imaging radiation-sensitive elements

An acid generator, photosensitive element technology, applied in photosensitive materials for optomechanical equipment, other chemical processes, photoengraving process of patterned surface, etc. Photographic photosensitivity and photolysis efficiency, effect of improving curing rate

Inactive Publication Date: 2005-08-17
EASTMAN KODAK CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There is no mention of using the resin to generate the acid used to catalyze the acid active composition

Method used

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  • Selected acid generating agents and their use in processes for imaging radiation-sensitive elements
  • Selected acid generating agents and their use in processes for imaging radiation-sensitive elements
  • Selected acid generating agents and their use in processes for imaging radiation-sensitive elements

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0112] Synthesis of 2-methoxy-4-(anilino)-diazobenzene (MSDS) acid generator of dodecylsulfate. While stirring, 16.0 g of sodium lauryl sulfate (Aldrich, Milwaukee, MI) in 300 ml of water was slowly added to 18.0 g of hydrogen sulfate 2-methoxy-4-(phenylamino)- Diazobenzene (Diverstec, Fort Collins, CO). The mixture was stored at 0-5°C in the dark for 5 hours. After decanting the water, the oil obtained was dissolved in 100 ml of ethyl acetate. with 50ml 5% NaHCO 3 The solution was washed and then washed with 50 ml of water. The organic layer was dried over anhydrous magnesium sulfate for 6 hours, and the solvent was removed by evacuation. As a result, 12.8 g of oil was obtained.

[0113] Proton NMR (in acetone-d 6 ): δ0.88(3H, t), 1.32(18H, m), 1.58(2H, m), 3.91(2H, t), 4.15(3H, s), 6.90-7.55(7H, m), 8.18( 1H, d) and 11.12 (1H, s).

Synthetic example 2

[0115] Synthesis of hexadecylsulfate 2-methoxy-4-(anilino)-diazobenzene (MSHDS) acid generator. Utilize 0.8g NaHCO in 25ml water 3 Neutralize 3.25 grams of 2-methoxy-4-(anilino)-diazobenzene bisulfate (Diverstec, Fort Collins, CO) in 50 ml of water and label the container A. Dissolve 3.45 g of sodium cetyl sulfate (TCI America, Portland, OR) in 150 ml of water (50°C) and label the container B. With stirring, solution A was slowly added to solution B and a precipitate formed after mixing was complete. The reaction mixture was stored at 0-5°C in the dark for 12 hours. The solid was collected by filtration and dried under vacuum. The yield was 5.4 g.

[0116] Proton NMR (in acetone-d 6 ): δ0.87(3H, t), 1.31(26H, m), 1.58(2H, m), 3.90(2H, t), 4.15(3H, s), 6.90-7.60(7H, m), 8.19( 1H, d) and 11.10 (1H, s).

Synthetic example 3

[0118] Synthesis of vinyl benzyl thiosulfate 2-methoxy-4-(anilino)-diazobenzene (MSVBTS) acid generator. While stirring, slowly add 25 ml of 5% hydrogen sulfate 2-methoxy-4 -(anilino)-diazobenzene (Diverstec, Fort Collins, CO). The mixture was stored at 0-5°C in the dark for 24 hours. After decanting the water, the oil obtained was washed three times with 10 ml of water. As a result, 1.13 g of oil was obtained, which was then dissolved in 99 g of 1-methoxy-2-propanol for use.

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Abstract

An acid generating agent useful for imaging photosensitive elements selected from compounds of formulae (I), (II) and (III). wherein R<1 >is selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group; wherein X is selected from the group consisting of oxygen, sulfur and selenium; wherein Y is selected from the group consisting of sulfur, selenium and tellurium; wherein Ar<1 >is selected from the group consisting of an unsubstituted and substituted aryl group; wherein R<2>, R<3 >and R<4 >are individually selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group or any two of them are bonded together to form a ring structure; and wherein R<5 >and R<6 >are individually selected from the group of an unsubstituted and substituted hydrocarbon or aryl group, or are bonded to each other to form a ring structure.

Description

technical field [0001] The present invention relates to selected acid generators useful in radiation sensitive patterning compositions. The present invention relates to said radiation-sensitive patterning composition and a method of imaging a radiation-sensitive element comprising said radiation-sensitive patterning composition. Background technique [0002] Thermal, negative-working printing plates are typically made from radiation-sensitive patterning compositions imaged on a substrate. These patterning compositions typically contain a radiation-sensitive material that is a mixture of an acid generator, a crosslinking resin or compound, a binder resin, and an infrared (IR) absorber. Many of the acid generators previously used in these patterning compositions contain either ozone-depleting elements, such as fluorine, or heavy metals, such as antimony (Sb) or arsenic (As), which may cause serious environmental pollution problems. Additionally, some of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C245/20C07C305/06C08F2/50C09K3/00G03F7/00G03F7/004G03F7/038
CPCC07C305/06G03F7/0045B41C2210/22C07C245/20B41C2210/24B41C2210/04B41C2210/06B41C1/1008B41C2210/262G03F7/038B41C2210/266
Inventor 陶烃黄建兵
Owner EASTMAN KODAK CO
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