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Productoion of glass buried light waveguide device by ionic mask method

A technology of optical waveguide and ions, which is applied in the direction of light guides, optical components, instruments, etc., can solve the problems of asymmetry and distribution, large influence of optical signal transmission loss, low coupling efficiency, etc., and achieve the effect of reducing transmission loss and coupling loss

Inactive Publication Date: 2006-03-15
ZHEJIANG NANFANG COMM GROUP +1
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Problems solved by technology

[0006] In order to overcome the asymmetry of the mode field of the glass ion exchange waveguide cross-section and the distribution on the glass surface, resulting in the low coupling efficiency with the optical fiber and the large influence of the glass surface on the transmission loss of the optical signal, the purpose of the present invention is to provide an ion mask method A method of making a glass-buried optical waveguide device, which makes the waveguide section closer to a circle, can overcome the influence of the glass surface state on the optical signal transmitted in the waveguide, and greatly improves the transmission loss. Coupling, reduce coupling loss

Method used

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  • Productoion of glass buried light waveguide device by ionic mask method

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Embodiment 1

[0015] Embodiment 1: As shown in the accompanying drawing, a glass-buried optical waveguide device is fabricated according to the following steps:

[0016] 1. Prepare a piece of clean glass;

[0017] 2. Deposit a layer of metal film of about 300nm on the glass surface by vacuum evaporation or radio frequency sputtering technology. In this example, metal aluminum is used;

[0018] 3. Carve out the optical power splitter pattern with conventional photolithography technology;

[0019] 4. Use ion exchange technology to carry out potassium-sodium ion exchange to make ion mask. First, put the potassium nitrate in a high-temperature furnace and bake for no less than 4 hours at a temperature of 280°C; then raise the temperature of the furnace to 360°C, and after the ion exchange source is completely melted, place the glass piece with the waveguide pattern engraved in step 3) into the exchange source for ion exchange to form an ion mask for 4 hours, and finally take out the glass she...

Embodiment 2

[0022] Embodiment 2: As shown in the accompanying drawing, a glass-buried optical waveguide device is fabricated according to the following steps:

[0023] 1. Prepare a piece of clean glass;

[0024] 2. Deposit a layer of metal film of about 300nm on the glass surface by vacuum evaporation or radio frequency sputtering technology. In this example, metal aluminum is used;

[0025] 3. Carve out the optical power splitter pattern with conventional photolithography technology;

[0026] 4. Use ion exchange technology to carry out potassium-sodium ion exchange to make ion mask. First mix sodium nitrate and potassium nitrate in a molar ratio of 1:1, prepare an ion exchange source, put the prepared ion exchange source in a high-temperature furnace and bake for no less than 4 hours at a temperature of 240°C; then Raise the temperature of the furnace to 400°C. After the ion exchange source is completely melted, put the glass sheet with the waveguide pattern engraved in step 3) into th...

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Abstract

A method for preparing glass buried light wave guide component by ion mask process includes depositing a layer of metal aluminum film on glass surface by vacuum evaporating or radio frequency sputtering, using normal photoetching process to etch out light power divider pattern, covering area to form wave guide by metal film and removing off metal film on nonwaveguide area when photoetching is applied, forming ion mask by carrying out K ¿C Na ion exchange then carrying out Ag ¿C Na ion exchange after metal mask is removed off, carrying out Na ion exchange to lower concentration of K and Ag at surface for forming buried light wave guide and finally carrying out annealing treatment.

Description

technical field [0001] The invention relates to a method for manufacturing a glass-buried optical waveguide device based on an ion mask method of a planar optical waveguide circuit. Background technique [0002] At present, optical waveguide devices such as modulators / demodulators, wavelength division multiplexers / demultiplexers, optical switches, optical power splitters, and optical amplifiers play an important role in optical networks. There are many materials used, and they realize one or more of the above-mentioned devices with different structures and principles. These materials mainly include III-V compound semiconductor materials, LiNbO 3 Materials, SOI (silicon on isolator), Si, SiO 2 , glass, organic polymers, etc. [0003] Among the materials mentioned above, compound semiconductor materials, LiNbO 3 The material is a crystal material, and the optical device made is related to polarization, and the material itself has a high refractive index, and the coupling w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/134
Inventor 李锡华王明华江晓清吕金良许坤良周海权
Owner ZHEJIANG NANFANG COMM GROUP
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