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Tantalum powder, and solid electrolyte capacitor using it

A solid electrolysis and capacitor technology, applied in the direction of electrolytic capacitors, capacitors, circuits, etc., can solve the problems of less leakage current and large electrostatic capacity, and achieve the effect of less leakage current, large electrostatic capacity, and reduced leakage current.

Active Publication Date: 2007-04-04
KAWATETABU MINING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the specific surface area of ​​the tantalum powder becomes large, according to JP-A No. 2001-223141, JP-A No. 2001-345238, JP-A No. Publication No. 2002-173371 and Patent No. 2632985, for example, even if the above-mentioned addition technology is used, nitrogen or other elements are added to the tantalum powder, and it is not necessarily possible to obtain a large electrostatic capacity and a small leakage current. solid electrolytic capacitor

Method used

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  • Tantalum powder, and solid electrolyte capacitor using it
  • Tantalum powder, and solid electrolyte capacitor using it

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] Argon was supplied as an electrode working gas (electrode working gas) at 20 NL (Normal Litter) / min in a DC plasma CVD apparatus with a power supply of 20 kW, and a plasma arc was generated under atmospheric pressure. In this plasma arc, tantalum pentachloride gas vaporized at 350°C (15 g / min in terms of the weight of tantalum pentachloride) is mixed with argon at 10 NL / min and hydrogen gas for reduction 80NL / min, introduced into the plasma arc, and carried out gas phase hydrogen reduction reaction to obtain tantalum powder.

[0058] Put 10 g of the tantalum powder into the heating furnace, raise the temperature to the processing temperature of 300° C. at a rate of 10° C. / min in a mixed gas flow of argon 5 NL / min and nitrogen 1 NL / min, and keep it for 30 minutes. Then, it was cooled to room temperature under argon 5 NL / min flow. For this tantalum powder, the hydrogen content and the nitrogen content were measured using a thermal conductivity gas analyzer, and the speci...

Embodiment 2～4

[0060] (Examples 2-4), (Comparative Examples 1-2)

[0061]The tantalum powder obtained by the gas-phase hydrogen reduction method in Example 1 is processed under the mixed gas flow of argon 5NL / min and nitrogen 1NL / min, and the processing temperature at this time is changed to the temperature shown in Table 1. In addition, the other Operate in the same way as in Example 1. It should be noted that the term "untreated" in Comparative Example 2 means that the tantalum powder was not heat-treated in a mixed gas flow of 5 NL / min of argon and 1 NL / min of nitrogen. The results are shown in Table 1.

[0062] In Examples 1 and 2 to 4 within the scope of the present invention, the leakage current is 0.5 nA / μFV or less, and the electrostatic capacity is 160,000 μFV / g or more. However, in Comparative Examples 1 and 2, since the ratio of the hydrogen content to the specific surface area is outside the scope of the present invention, the leakage current is large and the electrostatic capa...

Embodiment 5

[0064] 20 NL / min of argon as an electrode gas was supplied to a DC plasma CVD apparatus with a power of 20 kW, and a plasma arc was generated under atmospheric pressure. In this plasma arc, a mixed gas formed by mixing tantalum pentachloride gas (10 g / min as tantalum pentachloride powder) gasified at 350°C with argon 10 NL / min and hydrogen gas 100 NL / min is introduced. In the plasma arc, gas-phase hydrogen reduction reaction is carried out to obtain tantalum powder.

[0065] Put 10 g of the tantalum powder into the heating furnace, raise the temperature to the processing temperature of 200° C. at a rate of 10° C. / min in a mixed gas flow of argon 5 NL / min and nitrogen 1 NL / min, and keep it for 30 minutes. Then, it was cooled to room temperature under argon 5 NL / min flow. For this tantalum powder, the hydrogen content and the nitrogen content were measured using a thermal conductivity gas analyzer, and the specific surface area was measured by the BET method. As a result, the ...

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Abstract

A hydrogenated tantalum powder exhibiting a ratio of hydrogen content (ppm) to specific surface area (m<2> / g) of 10 to 100. As the tantalum powder has a large specific surface area, by using the same as an anode of solid electrolytic capacitor, there can be obtained a solid electrolytic capacitor of large electric capacitance and reduced leakage current.

Description

technical field [0001] The present invention relates to a hydrogen-containing tantalum powder (hydrogen-containing tantalum powder) suitable for an anode material (anode material) of a solid electrolytic capacitor, and an anode for a solid electrolytic capacitor obtained by sintering the tantalum powder and its use A solid electrolytic capacitor with this anode. Background technique [0002] In recent years, electronic integrated circuits (electric integrated circuits) are seeking to work at lower voltages, high frequency, and low noise. For solid electrolytic capacitors, it is necessary to reduce ESR (equivalent series resistance), reduce ESL ( The requirements for equivalent series inductance (equivalent series inductance) are also increasing. Metal powder suitable for anode materials of solid electrolytic capacitors, such as: tantalum, niobium, titanium, tungsten, molybdenum, etc. Among these substances, especially capacitors using tantalum have low ESR and large capaci...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B22F1/00B22F5/00C22C27/02H01G9/052B22F1/05B22F1/145C22C1/04
CPCB22F2999/00B22F1/0011C22C1/045H01G9/0525B22F1/0088C22C27/02B22F1/05B22F1/145B22F1/00B22F2201/10B22F2201/013B22F2201/02
Inventor 佐藤信之江波户修桐原理
Owner KAWATETABU MINING
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