Mould and making method thereof

A mold and base material technology, applied in the field of mold and its preparation, can solve the problems of DLC film shedding, etc., and achieve the effects of increased corrosion resistance, low content of additives, and low coefficient of friction

Inactive Publication Date: 2007-05-16
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
View PDF0 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This kind of DLC film is generally a single layer, which is made by DC magnetron sputtering method. However, after the m

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mould and making method thereof
  • Mould and making method thereof

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0012] A mold, its manufacturing method and manufacturing device will be described below with reference to the accompanying drawings.

[0013] Please refer to Fig. 1, the mold 1 of the present embodiment comprises a substrate 10, a protective layer 20 formed on the surface of the substrate 10, and the protective layer 20 includes an adhesive layer 21, a graded multilayer film 22 and a class of diamond Carbon thin film23.

[0014] The material forming the substrate 10 must be able to withstand large pressure without deformation, for example, it can be iron-carbon-chromium alloy, iron-carbon-chromium-molybdenum alloy or iron-carbon-chromium-vanadium-molybdenum alloy. In order to strengthen the bonding force between the protective layer 20 and the substrate 10, the surface of the substrate 10 needs to be smooth, preferably, its average surface roughness (Ra) is less than 10 nanometers, which can be achieved by mirror polishing. Adhesive layer 21 is formed on substrate 10 with a ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a mould and relative production, wherein said mould comprises a base and above protective layer; said protective layer comprises an adhesive layer, a graded multilayer film and an adamantine carbon film above the base; said adhesive layer is the film of chromic, titanium, silicon, chrome-nitride, titanium nitride, silicon carbide or silicon nitride; said graded multilayer film is N-layer structure, while 5<=N<=30 and each layer contains adamantine carbon and additive; said additive contains chromic, titanium, silicon, chrome-nitride, titanium nitride, silicon carbide or silicon nitride; from the first layer near the adhesive layer to the N layer near the adamantine carbon film, the additive content is reduced. The invention has high combination between protective layer and base, with better abrasion resistance and corrosion resistance.

Description

【Technical field】 [0001] The invention relates to a mold and a preparation method thereof, in particular to a mold with a film layer that is not easy to fall off, has good wear resistance and corrosion resistance, and a preparation method thereof. 【Background technique】 [0002] Molds are necessary for large-scale production in the industry. Considering the cost, a set of molds may be required to work hundreds of thousands of times without deformation that affects the quality of the workpiece. The most important factors for mold deformation include wear and corrosion. Therefore, in order to prolong the service life of the mold, the corrosion resistance and friction resistance of the mold are particularly important. [0003] Therefore, the general molds mostly use alloy materials with high hardness and strong chemical stability, but their performance is still not ideal. There is friction between the mold and the workpiece when it is working. After many operations, the mold w...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B32B33/00B32B5/14C23C14/02C23C14/06C23C14/34
CPCY10T428/12625C23C14/025C23C14/46Y10T428/31678C23C14/0605Y10T428/30
Inventor 陈杰良
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap