Semiconductor device and method for manufacturing the same, and electric device

a semiconductor and semiconductor technology, applied in the field of semiconductor devices, can solve the problems of complex process and high target cost, and achieve the effect of high circuit integration and simplified steps
US20090073325A1Inactive Publication Date: 2009-03-19SEMICON ENERGY LAB CO LTD
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Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
SEMICON ENERGY LAB CO LTD
Publication Date
2009-03-19
Estimated Expiration
Not applicable · inactive patent

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Abstract

It is an object of the present invention to simplify steps needed to process a wiring in forming a multilayer wiring. In addition, when a droplet discharging technique or a nanoimprint technique is used to form a wiring in a contact hole having a comparatively long diameter, the wiring in accordance with the shape of the contact hole is formed, and the wiring portion of the contact hole is likely to have a depression compared with other portions. A penetrating opening is formed by irradiating a light-transmitting insulating film with laser light having high intensity and a pulse high in repetition frequency. A plurality of openings having a minute contact area is provided instead of forming one penetrating opening having a large contact area to have an even thickness of a wiring by reducing a partial depression and also to ensure contact resistance.
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Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a semiconductor device having a circuit including a thin film transistor (hereinafter, referred to as a TFT) and to a manufacturing method thereof. Specifically, the present invention relates to a semiconductor device having a circuit including a field effect transistor (hereinafter, referred to as an FET). For example, the present invention relates to an electronic device incorporating, as part thereof, a large-scale integrated circuit (LSI), an electro-optic device typified by a liquid crystal display panel, a light-emitting display device having an organic light-emitting element, a sensor device such as a line sensor, or a memory device such as an SRAM or a DRAM, for example.

[0003] 2. Description of the Related Art

[0004] Note that a semiconductor device in this specification means general devices and apparatuses that can function with the use of semiconductor characteristics; for exampl...

Claims

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