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Recovery Method for High Purity Platinum

a recovery method and platinum technology, applied in the direction of process efficiency improvement, etc., can solve the problems of severe contamination, all mill ends become scraps, and portions that come into contact with the target become contaminated, and achieve the effect of superior ability

Inactive Publication Date: 2013-06-06
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention enables the efficient removal of various elements such as cobalt, chromium, copper, iron, nickel, and silicon from a platinum-containing target scrap or other production scraps, and the separation of ruthenium from the magnetic material target. This is achieved with a simple process.

Problems solved by technology

All of such mill ends become scraps.
During the production process of the target, as a result of the plastic working such as forging / rolling or mechanical processing such as cutting of the ingot after the ingot is melted and cast, and due to the process of bonding the target to the backing plate, the portion that comes into contact with the target becomes contaminated.
In particular, contamination is severe which is caused by heavy metals and the like from the material configuring the cutting tools used for the mechanical processing and peripheral processing tools is severe.
Since platinum is an expensive material, it is necessary to recover and reuse the same, but there is a problem in that a material containing the foregoing contaminants cannot be used as is.
The foregoing impurities may cause the deterioration of performance of recording mediums, hard disks and semiconductor device elements, as well as cause the deterioration of performance of thin films as a result of generating splashes, abnormal discharges, particles and the like during the sputtering process.
Since ruthenium is a platinum group element, in addition to the properties being similar, there is also the problem of platinum and ruthenium being difficult to separate.
Since platinum itself is an extremely expensive material, platinum must be recovered at a high yield.
However, it cannot be said that these patent documents offer an efficient recovery method for separating ruthenium from platinum and recovering high purity platinum.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

example 1

[0048]In Example 1, scraps of a magnetic material target containing platinum, cobalt, chromium, and ruthenium were dissolved in aqua regia and residue was eliminated, and the resulting product was diluted in water to obtain an aqua regia solution having a platinum concentration of 30 g / L and a ruthenium concentration of 5 g / L.

[0049]The aqua regia solution and ammonium chloride were caused to react at 45° C. to obtain chloroplatinic ammonium salt ((NH4)2PtCl6) crystals. Subsequently, the crystals were roasted at 800° C. to obtain a platinum sponge, and the platinum recovery rate from the aqua regia solution and the ruthenium content rate as an impurity were measured. The results are shown in Table 1.

TABLE 1platinum recovery rateruthenium content rate(%)in the platinum salt (wt %)Example 199.50.5Example 299.30.3Example 399.21.7Comparative Example 196.00.6Comparative Example 299.52.3Comparative Example 399.23.5

[0050]As shown in Table 1, the platinum recovery rate reached 99.5%, and the...

example 2

[0051]In Example 2, scraps of a magnetic material target containing platinum, cobalt, chromium, and ruthenium were dissolved in aqua regia and residue was eliminated, and the resulting product was diluted in water to obtain an aqua regia solution having a platinum concentration of 18 g / L and a ruthenium concentration of 3 g / L.

[0052]The aqua regia solution and ammonium chloride were caused to react at 90° C. to deposit chloroplatinic ammonium salt, and the deposited chloroplatinic ammonium salt was roasted at 800° C. to obtain a platinum sponge, and the platinum recovery rate from the aqua regia solution and the ruthenium content rate as an impurity were measured. The results are shown in Table 1.

[0053]As shown in Table 1, the platinum recovery rate reached 99.3%, and the ruthenium content rate in the platinum salt decreased to 0.3 wt %. This ruthenium content was sufficiently decreased to use the recycled platinum as a target.

[0054]Moreover, similar platinum purity and ruthenium red...

example 3

[0055]In Example 3, scraps of a magnetic material target containing platinum, cobalt, chromium, and ruthenium were dissolved in aqua regia and residue was eliminated, and the resulting product was diluted in water to obtain an aqua regia solution having a platinum concentration of 16 g / L and a ruthenium concentration of 5 g / L.

[0056]The aqua regia solution and ammonium chloride were caused to react at 50° C. to deposit chloroplatinic ammonium salt, and the deposited chloroplatinic ammonium salt was roasted at 800° C. to obtain a platinum sponge, and the platinum recovery rate from the aqua regia solution and the ruthenium content rate as an impurity were measured. The results are shown in Table 1.

[0057]As shown in Table 1, the platinum recovery rate reached 99.2%, and the ruthenium content rate in the platinum salt decreased to 1.7 wt %. This ruthenium content was sufficiently decreased to use the recycled platinum as a target. Moreover, similar platinum purity and ruthenium reductio...

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Abstract

A high purity platinum recovery method including the steps of dissolving a platinum alloy containing ruthenium in aqua regia and eliminating residue, thereafter causing acid with platinum dissolved therein and an ammonium chloride solution to react so as to deposit chloroplatinic ammonium salt, and reducing the chloroplatinic ammonium salt to obtain a platinum sponge. The method is characterized in that acid with platinum dissolved therein and the ammonium chloride solution are caused to react at a temperature of 40° C. or higher. Provided is a method which enables recovery, at a high yield, of high purity platinum which can be reused in a platinum and a platinum-containing target as a result of efficiently eliminating ruthenium, cobalt, chromium, copper, iron, nickel, silicon and the like which become included in a spent platinum alloy sputtering target, particularly a magnetic material target, and in scraps such as mill ends, sawdust, and surface grinding scraps generated during the production process of such a target.

Description

TECHNICAL FIELD[0001]The present invention relates to a recovery method of high purity platinum for recovering high purity platinum, at a high yield, from a platinum alloy containing platinum and ruthenium as components, and in particular from scraps of a magnetic material target or the like.BACKGROUND ART[0002]In recent years, pursuant to the considerable advancement of semiconductor integrated circuits, various thin films are being formed for circuit design and the formation of various electrical and electronic devices. Among the above, an alloy sputtering target containing platinum is also used for forming a specific thin film for use as a magnetic thin film for a recording medium or as a semiconductor material. This kind of platinum alloy target often also contains ruthenium as an alloy element.[0003]These thin films are formed by sputtering an alloy target containing platinum or the like in an inert atmosphere of argon gas or the like.[0004]During the stage that this kind of ta...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C22B3/00
CPCC22B5/02C22B11/042C22B11/025Y02P10/20
Inventor SEKIGUCHI, JUNNOSUKE
Owner JX NIPPON MINING & METALS CORP