Titanium dioxide film adulterated with rare soil and the preparing method
A titanium dioxide, rare earth doping technology, applied in chemical instruments and methods, catalyst activation/preparation, chemical/physical processes, etc., can solve the problem of insufficient utilization of sunlight energy, poor decorative aesthetic effect, limited photocatalytic activity, etc. problems, to achieve the effect of improving photocatalytic performance, fast sample preparation, and simple equipment
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Embodiment 1
[0018] 1) Clean the glass substrate with 10% hydrofluoric acid;
[0019] 2) Put the cleaned glass substrate into the reaction chamber of the chemical vapor deposition device, and pass N 2 Clean the reaction chamber; heat TTIP to 100°C, Eu(TMHD) 3 heated to 150°C with N 2 Combining TTIP and Eu(TMHD) 3 Into the reaction chamber, where the flow rate of TTIP is 6.08slm, Eu(TMHD) 3 The flow rate is 1.02slm, N 2 The flow rate is 19.24slm. Under the temperature condition of 600°C, the substrate is moved at a speed of 1.0m / min for deposition. After the deposition is completed, stop feeding the gas, take out the glass substrate, and cool it down;
[0020] The prepared rare earth europium (Eu) doped titanium dioxide film (Eu:Ti=1.0:99.0) with a thickness of about 300nm has a photocatalytic performance nearly 10% higher than that of ordinary titanium dioxide film. After being excited by ultraviolet light, the naked eye can observe obvious The red light, detected by the instrument, h...
Embodiment 2
[0022] 1) Clean the glass substrate with 10% hydrofluoric acid;
[0023] 2) Put the cleaned glass substrate into the chemical vapor deposition device reaction chamber, and pass helium gas to clean the reaction chamber; heat ethyl titanate to 150°C, Tb(acac) 3 .Phen is heated to 100°C, and ethyl titanate and Tb(acac) are mixed with helium 3 .Phen passes into the reaction chamber, wherein the flow rate of ethyl titanate is 7.42slm, Tb(acac) 3 .Phen has a flow rate of 7.29slm, N 2 The flow rate is 18.20slm, and at a temperature of 570°C, move the substrate at a speed of 3.0m / min for deposition. After the deposition is completed, stop feeding the gas, take out the glass substrate, and cool it down;
[0024] The prepared rare earth samarium (Tb)-doped titanium dioxide film (Tb:Ti=15:85) with a thickness of about 120nm has a photocatalytic performance that is nearly 40% higher than that of ordinary titanium dioxide films. After being excited by ultraviolet light, green light can b...
Embodiment 3
[0026] 1) Clean the glass substrate with 10% hydrofluoric acid;
[0027] 2) Put the cleaned glass substrate into the chemical vapor deposition device reaction chamber, and pass in argon to clean the reaction chamber; heat the TTIP to 130°C, LaCl 3 Heated to 180 °C, TTIP and LaCl with argon 3 into the reaction chamber, and at the same time into O 2 , where the flow rate of TTIP is 12.16slm, LaCl 3 The flow rate is 3.39slm, O 2 The flow is 11.53slm, N 2 The flow rate is 12.76slm, and at a temperature of 580°C, move the substrate at a speed of 1.5m / min for deposition. After the deposition is completed, stop feeding the gas, take out the glass substrate, and cool it down;
[0028] The prepared rare earth lanthanum (La)-doped titanium dioxide film (La:Ti=1.9:98.1) with a thickness of about 500nm has a photocatalytic performance nearly 25% higher than that of ordinary titanium dioxide film. After being excited by ultraviolet light, green light can be observed , the luminescent ...
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