Low-radiation self-cleaning composite function glass and producing method
A composite function and low-radiation technology, which is applied in the field of low-radiation self-cleaning composite functional glass and its online preparation, can solve the problems that are difficult to achieve high transmittance, low radiation rate, glass transmittance reduction, etc., and achieve favorable Popularization and application, good physical and chemical properties, and the effect of reducing product cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Example Embodiment
[0022] Example 1
[0023] The low-emissivity self-cleaning composite functional glass described in this embodiment is a multi-layer film, and from the outer layer to the inner layer are SiO 2 Transition layer, Sb 3+ , F - Ion doped SnO 2 Layer, La 3+ Ion doped SiO 2 -TiO 2 Floor. Among them: SiO 2 The control thickness of the transition layer is 20nm, SnO2 The control thickness of the layer is 250nm, SiO 2 -TiO 2 The control thickness of the layer is 15 nm.
[0024] The SiO 2 Preparation: Mix ethyl orthosilicate, ethanol, deionized water, and nitric acid in a molar ratio of 1:14:6:0.03, mix and stir at room temperature for 6 hours to cause hydrolysis reaction to produce silica sol .
[0025] The SnO 2 Preparation: Mix stannous chloride dihydrate, deionized water and ethanol at a molar ratio of 1:40:0.02, stir in a constant temperature reactor at 50°C for 20 hours, and then add the molar ratio of 0.17:0.04:40. Anhydrous ethanol solution of trifluoroacetic acid and antimony trichlor...
Example Embodiment
[0032] Example 2
[0033] The low-emissivity self-cleaning composite functional glass described in this embodiment is a multi-layer film, and the outer layer is successively SiO 2 Transition layer, Sb 3+ Ion doped SnO 2 Layer, Zn 2+ Ion doped SiO 2 -TiO 2 Floor. Among them: SiO 2 The control thickness of the transition layer is 20nm, SnO 2 The control thickness of the layer is 200nm, SiO 2 -TiO 2 The control thickness of the layer is 20 nm.
[0034] The SiO 2 Preparation: Mix ethyl orthosilicate, ethanol, deionized water, and nitric acid in a molar ratio of 1:14:6:0.03, mix and stir at room temperature for 6 hours to cause hydrolysis reaction to produce silica sol .
[0035] The SnO 2 Preparation: Mix stannous chloride dihydrate, deionized water, and ethanol at a molar ratio of 1:40:0.02, stir in a constant temperature reactor at 50°C for 20 hours, and then add trichloride with a molar ratio of 0.04:40. Antimony and anhydrous ethanol solution, control the molar ratio of Sb:Sn to 0...
Example Embodiment
[0042] Example 3
[0043] The low-emissivity self-cleaning composite functional glass described in this embodiment is a multi-layer film, and from the outer layer to the inner layer are SiO 2 Transition layer, F - Ion doped SnO 2 Layer, Ag + Ion doped SiO 2 -TiO 2 Floor. Among them: SiO 2 The control thickness of the transition layer is 20nm, SnO 2 The control thickness of the layer is 250nm, SiO 2 -TiO 2 The control thickness of the layer is 20 nm.
[0044] The SiO 2 Preparation: mixing ethyl orthosilicate, ethanol and deionized water, then adding organic acid or inorganic acid as catalyst, stirring and mixing at room temperature to cause hydrolysis and polymerization reaction to produce silica sol. Ethyl orthosilicate: ethanol: deionized water: organic acid or inorganic acid are mixed in a molar ratio of 1:14:5:0.03.
[0045] The SnO 2 Preparation: Mix stannous chloride dihydrate, deionized water, and ethanol at a molar ratio of 1:40:0.02, stir in a constant temperature reactor ...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap