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Transparent electrode and its manufacturing method

A technology for transparent electrodes and manufacturing methods, applied in electrode system manufacturing, cold cathode manufacturing, cable/conductor manufacturing, etc., can solve the problems of lack of durability, difficult to etch, and increased crystallinity of the surface of transparent conductive films, and achieves heat and humidity resistance. Excellent performance and low price

Inactive Publication Date: 2007-11-21
IDEMITSU KOSAN CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] However, it is known that zinc oxide film is not resistant to acid and alkali solutions in nature, so it does not have durability and cannot be used practically.
In addition, in the film formation of zinc oxide, the crystallinity of zinc oxide near the substrate is lowered, and the crystallinity of the surface of the transparent conductive film is increased. Therefore, in the etching process, the film near the substrate is easily etched from the surface, and there are The problem that the etched electrode forms an undercut
[0016] On the other hand, since tin oxide is too chemically stable, there is a problem that it is difficult to etch even with strong acid aqua regia (a mixture of nitric acid and hydrochloric acid).

Method used

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  • Transparent electrode and its manufacturing method
  • Transparent electrode and its manufacturing method
  • Transparent electrode and its manufacturing method

Examples

Experimental program
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Embodiment

[0100] Hereinafter, the present invention will be further specifically described through examples.

[0101] [Production of sputtering target and substrate with transparent conductive film]

manufacture example 1

[0103] (1) Production of sputtering target

[0104] Zinc oxide powder (manufactured by Shirasui Tec Co., Ltd.) with an average particle size of 1 μm or less and tin oxide powder (manufactured by Mitsubishi Materials Corporation) with an average particle size of 1 μm or less were mixed so that Zn / (Zn+Sn)=0.79 (atomic ratio) ) ratio, put it into a resin crucible, and then add pure water to use hard ZrO 2 Ball mill for wet ball mill mixing. The mixing time was 20 hours.

[0105] The resulting slurry was taken out, filtered, dried and granulated.

[0106] Apply 294MPa (3t / cm 2 ) pressure, pressurize and form with cool water pressure.

[0107] The molded body was sintered as described below.

[0108] In the sintering furnace, at every 0.1m 3 Sintering was performed at 1500° C. for 5 hours in an atmosphere in which oxygen was introduced at a rate of 5 L / min in the furnace volume. At this time, the temperature was raised to 1000°C at 1°C / min, and to 1000-1500°C at 3°C / min. Th...

manufacture example 2-7

[0121] Zinc oxide powder with an average particle size of 1 μm or less and tin oxide powder with an average particle size of 1 μm or less were used as raw material powders, and the ratio of zinc atoms to tin atoms was prepared in the ratio shown in Table 1. 1 A sputtering target (sintered compact target 2-7) was produced in the same manner, and a substrate on which a transparent conductive film was formed was produced.

[0122] In addition, the sputtering target has a diameter of 152 mm and a thickness of 5 mm.

[0123] Tables 1 and 2 show the properties of the sputtering target and the evaluation results of the transparent conductive film.

[0124] [Production of transparent electrodes]

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Abstract

Disclosed is an indium-free transparent electrode which is excellent in alkali resistance, wet heat stability and etching properties. Specifically disclosed is a transparent electrode mainly containing zinc oxide and tin oxide wherein the taper angle at the edge portion of the electrode is 30-89 DEG . The ratio of zinc atoms to the total of zinc atoms and tin atoms in the transparent electrode (Zn / (Zn + Sn) atomic ratio) is preferably within the range of 0.5-0.9.

Description

technical field [0001] The present invention relates to a transparent electrode used for thin displays and the like. More specifically, it relates to a transparent electrode mainly composed of zinc oxide and tin oxide, and an electrode whose tip is tapered, and a method for manufacturing the electrode. Background technique [0002] As for liquid crystal display devices, due to their characteristics of low power consumption and ease of full-color display, attention has been paid to thin displays. In recent years, developments related to larger display screens have been active. Among them, in each pixel, α-Si type thin film transistors (TFTs) or p-Si type TFTs are used as switching elements, and the active matrix type liquid crystal flat panel display is arranged in a matrix and driven. High-definition, without degrading the contrast ratio, is attracting attention as a high-performance flat-panel display for color display. [0003] In such an active matrix liquid crystal fla...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14H01J11/02G02F1/1343H01L51/50H01B13/00H05B33/10H01J9/02H05B33/28H01J11/22H01J11/34
Inventor 井上一吉田中信夫矢野公规
Owner IDEMITSU KOSAN CO LTD
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