Chemical copper plating solution and technique thereof
Patent Information
- Authority / Receiving Office
- CN ยท China
- Current Assignee / Owner
- MITAC PRECISION TECH CO LTD SHUNDE DISTRICT FOSHAN CITY
- Publication Date
- 2007-11-28
- Estimated Expiration
- Not applicable ยท inactive patent
Abstract
Description
technical field
[0001] The invention relates to a surface treatment process, in particular to a novel electroless copper plating solution and process. Background technique
[0002] The traditional electroless copper plating process uses formaldehyde as a reducing agent, and EDTA and potassium sodium tartrate as a single or mixed complexing agent. Among them, the formaldehyde used has serious environmental pollution, and its smell is unpleasant, teratogenic, and carcinogenic. Mutagenicity, carcinogenicity. Therefore, to address this problem, some formaldehyde-free electroless copper plating solutions have been developed, however, most of the conventional formaldehyde-free electroless copper plating solutions have poor stability due to their high reactivity, and decompose quickly when used. Therefore need to develop the formaldehyde-free electroless plating solution with high stability, and use it can finish electroless copper plating process rapidly. Contents of the invent...