Light scribing device and Aligning system and aligning method used for light scribing device

An alignment system and lithography technology, applied in the field of alignment systems, can solve problems such as affecting alignment accuracy, reducing diffraction efficiency, quasi-signal intensity attenuation, etc., so as to improve alignment accuracy, increase capture range, and reduce alignment The effect of the effect of precision
CN101135860BActive Publication Date: 2010-05-19SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
4 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Publication Date
2010-05-19

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The system comprises: a light source module, a lighting module, an imaging module, a detection module and a signal processing and positioning module. The imaging module is used for collecting the reflected light and diffracted light of the alignment mark to form a first optical path and a second imaging optical path; after said alignment mark is imaged through the first and second imaging opticalpath, it is modulated by a first reference grating and second reference grating; the detection module detects the strength of the transmitting light of the alignment mark after modulated by the firstreference grating and the strength of the transmitting light of the alignment mark after modulated by the second reference grating to get a first light signal and a second light signal; the signal processing and positioning module uses the amplitude information of the first light signal and the phase information of the second light signal to confirm the location information of the alignment mark.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The present invention relates to a lithographic device in the field of integrated circuit or other micro device manufacturing, and relates to a lithographic device, an alignment system and an alignment method for a lithographic device Background technique

[0002] The photolithography apparatus in the prior art is mainly used in the manufacture of integrated circuits (ICs) or other micro devices. With a photolithographic apparatus, multilayer masks with different mask patterns are sequentially imaged in precise alignment on a photoresist-coated wafer, such as a semiconductor wafer or an LCD panel. Lithography devices are generally divided into two categories, one is a stepping lithography device, the mask pattern is exposed and imaged on one exposure area of ​​the wafer, and then the wafer moves relative to the mask to move the next exposure area to the mask pattern and under the projection objective, the mask pattern is again exposed on another expos...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More