Sub-wavelength micro-nano structure using polystyrol ball to focused photoetching form

Abstract

The present invention provides a production method used for focusing lithography forming sub-wavelength micro-nanostructure of polystyrene sphere, and is characterized in that: surface of substrate material firstly selected is sequentially in a spinning manner coated with a layer of anti-corrosion agent, evaporated with a layer of metal structure, then in a spinning manner coated with a layer of interval layer, and finally assembled with a layer of the polystyrene sphere. The structure is exposed in exposure system, then the polystyrene sphere, the interval layer and the metal layer structureare removed, the substrate is positioned into developing agent for development and obtainment of target structure, and finally the structure is transmitted to the substrate by etch of the target structure. The present invention adopts the polystyrene sphere as a focusing lens, further reduces the cycle and dimension of the lens, has stimulation of surface plasma inside the metal in the focusing and exposure as the metal structure is evaporated on the surface of the exposed anti-corrosion agent, improves resolution of a focusing focal spot, reduces the characteristic size of the forming targeted structure, and provides an effective method for the production of the sub-wavelength micro-nanostructure.

Description

Using polystyrene spheres to form sub-wavelength micro-nano structures by focused lithography Technical field The invention relates to a manufacturing method of nanostructures, in particular to a method for using polystyrene balls to perform focused photoetching to form subwavelength micro-nano structures. Background technique In recent years, with the rapid development of micro-nano processing technology and nano-materials, the electromagnetic properties of micro-nano metal structures are receiving more and more attention. The interaction of light and surface micro-nano metal structures has produced a series of new strange physical phenomena. For example, in 1998, French scientist Ebbesen and his collaborators discovered the extraordinary enhancement of light passing through the sub-wavelength metal hole array (Extraordinary Optical Transmission). The study by H.J. Lezec et al. further showed that when light passes through sub-wavelength metal nanoholes, the transmittance ca...

AI Technical Summary

Problems solved by technology

In recent years, the focus lithography method has gradually developed into a lithography method for making microstructures. It uses a microlens array or a structure equivalent to a microlens array to expose the resist, and uses the focusing effect of the lens to Form the maximum value of energy at the focal spot, and use the extremely high value of energy at the focal point to perform photolithography, thereby forming a nanostructure on the underlying photoresist. However, in the production process of this method, the traditional microlens array Generally, the caliber and numerical aperture are relatively large, so the period and feature size of the formed target structure are large. At the same time, because the size of the focal spot is limited by the diffraction limit, the size of the pattern is limited, which brings great challenges to the formation of nanostructures. difficulty

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