Metal microgrid transparent electrode and method for producing the same
A technology of transparent electrodes and micro-grids, applied in metal material coating process, circuits, electrical components, etc., can solve the problems of complex preparation process of transparent electrodes, low transmittance in the ultraviolet band, high resistivity, and achieve good electrical conductivity. , low cost, high transmittance effect
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[0019] Example 1. Preparation of Ni microgrid transparent electrode
[0020] 1. Assemble a single-layer colloidal crystal template using monodisperse polystyrene microspheres with a particle size of 1.4μm
[0021] 2. Using magnetron sputtering method to deposit metal Ni on the surface of the template, working pressure 0.5Pa, power 40W
[0022] 3. The sputtering stops after 5 minutes, and Ni is evenly plugged in the gap of the single-layer colloidal crystal template.
[0023] 4. Put the Ni-filled template into the toluene solution for ultrasonic treatment
[0024] 5.Sonication stops after 30 minutes
[0025] 6. Take it out of the toluene solution and dry it to obtain a highly ordered Ni micro grid transparent electrode (as shown in Figure 3): aperture, 1.2μm (as shown in Figure 2(a)); grid thickness , 10nm; grid width, 140nm.
Example Embodiment
[0026] Example 2. Preparation of Al microgrid transparent electrode
[0027] 1. Assemble a single-layer colloidal crystal template using monodisperse polystyrene microspheres with a particle size of 3.9μm
[0028] 2. Using magnetron sputtering method to deposit metal Al on the surface of the template, working pressure 0.5Pa, power 50W
[0029] 3. The sputtering stops after 5 minutes, and the gap of the single-layer colloidal crystal template is evenly filled with Al
[0030] 4. Put the Al-filled template into the toluene solution and ultrasonic treatment
[0031] 5.Sonication stops after 30 minutes
[0032] 6. Take it out of the toluene solution and dry it to obtain an Al micro grid transparent electrode with a high degree of order: aperture, 3.4μm (as shown in Figure 2(b)); grid thickness, 25nm; grid width, 250nm.
Example Embodiment
[0033] Example 3. Preparation of silver Ag microgrid transparent electrode
[0034] 1. Use monodisperse polystyrene microspheres with a particle size of 5.1μm to assemble a single-layer colloidal crystal template
[0035] 2. Using magnetron sputtering method to deposit metal Ag on the surface of the template, working pressure 0.5Pa, power 80W
[0036] 3. The sputtering stops after 8 minutes, and the gap of the single-layer colloidal crystal template is uniformly filled with Ag.
[0037] 4. Put the Ag-filled template into the toluene solution and sonicate it
[0038] 5.Sonication stops after 30 minutes
[0039] 6. Take out from the toluene solution and dry to obtain a highly ordered Ag microgrid transparent electrode: aperture, 4.5μm (as shown in Figure 2(c)); grid thickness, 30nm; grid width, 580nm.
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