Metal microgrid transparent electrode and method for producing the same
A technology of transparent electrodes and micro-grids, applied in metal material coating process, circuits, electrical components, etc., can solve the problems of complex preparation process of transparent electrodes, low transmittance in the ultraviolet band, high resistivity, and achieve good electrical conductivity. , low cost, high transmittance effect
Inactive Publication Date: 2008-08-20
BEIHANG UNIV
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The present invention relates to a metal microgrid transparent electrode and fabricating method thereof. The transparent electrode has orderly metal microgrid structure whose thickness is 10-50nm, width is 140-800 nm and aperture is 1-6 mum. The fabricating method is that: assembling single-layer colloid crystal template by monodisperse polystyrene microspheres, depositing metal in template sews by magnetron sputtering technique, and the sputtering time is 5-10 minutes; at last, eliminating single-layer colloid crystal template by ultrasonic washing of organic solvent for 20-30 minutes and the said transparent electrode is gained. The metal microgrid structure of transparent electrode has high light transmittance, low resistance and low cost, has widely usage in optoelectronic device, photodetector and semiconductor irradiance. The fabricating method of present invention has simply technics and easy operation.
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Property | Measurement | Unit |
Particle size | 1.4 | µm |
Aperture | 1.2 | µm |
Particle size | 3.9 | µm |
tensile | MPa | |
Particle size | Pa | |
strength | 10 |
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