Method for controlling growing multiple layer film for making multiple-level micro-reflector

A micro-mirror and multi-layer film technology, applied in the field of multi-level micro-mirror production, can solve the problems of difficult to precisely control corrosion or etching depth, difficult to guarantee horizontal accuracy, poor accuracy and repeatability, etc. Repeatability, high level accuracy, high flatness effect

Active Publication Date: 2008-10-22
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

Multi-level micro-mirrors can be used to perform multiple photolithography and multiple corrosions (dry or wet) on the substrate by binary optical technology to prepare stepped microstructures on various materials such as quartz. This method has the following disadvantages: 1. Due to multip

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  • Method for controlling growing multiple layer film for making multiple-level micro-reflector
  • Method for controlling growing multiple layer film for making multiple-level micro-reflector
  • Method for controlling growing multiple layer film for making multiple-level micro-reflector

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[0022] The method for manufacturing a multi-level micro-mirror by controlling the growth of a multilayer film of the present invention will be described in detail below. In this method, a multi-stage micro-reflector is made by a controlled growth multilayer film method. The total number of steps is 16, and the total width of the multi-stage micro-reflector is 8mm. The specific process flow is as follows:

[0023] (1) Use double-sided polished silicon or glass or silicon dioxide or silicon carbide or molybdenum wafers or quartz wafers with a surface roughness of 0.2 nm to 1 μm as the substrate, and clean it;

[0024] (2) Coating photoresist on the upper surface of the substrate, exposing and developing with the first lithography plate, hardening the film to form the required masking pattern; the width of the bright stripes and dark stripes of the first lithography plate are each L / 2 1 ; Then by magnetron sputtering or radio frequency sputtering or ion beam sputtering or DC sputteri...

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Abstract

The invention relates to a method for producing a multi-stage microreflecting mirror by controlling the growth of a multi-layer film, which comprises the following steps that: a substrate is produced and is treated with cleaning; a first photomask is used to photoetch for forming a needed masking pattern, the width of a bright fringe and the width of a dark fringe of the first photomask are respectively L/2<1>; then coating material is deposited, photoresist and a film on the photoresist are peeled off, and a multi-stage film staircase is formed; each film layer staircase is orderly produced according to the method, the width of a bright fringe and the width of a dark fringe of the nth photomask are respectively L/2<n>, until the needed staircases are reached to finish the production of the substrate of a multi-stage microreflecting mirror; the produced substrate of the multi-stage microreflecting mirror is used as a template production mould, then a die casting method is used to produce a multi-stage staircase structure; and the surface of the multi-stage staircase structure or the substrate of the multi-stage microreflecting mirror is coated with a reflection increasing film. The method effective improves the longitudinal dimension accuracy and the repetitiveness of the staircase, has strong process controllability and good repetitiveness, does not use chemical etching, and reduces the pollution.

Description

technical field [0001] The invention relates to a method for manufacturing a multi-stage micro-reflector, in particular to a method for manufacturing a multi-stage micro-mirror for visible and infrared bands by controlling the growth of a multilayer film. Background technique [0002] As a light reflection device, multistage micromirrors are widely used in optical systems, such as spectral analysis, beam shaping and fiber coupling. [0003] With the development of optical systems toward small size and compact structure, the miniaturization of devices in optical systems has become an important research topic for optical devices. The design and fabrication level of micro-optical devices directly determines the performance of optical instruments. Multi-level micro-mirrors can be used to perform multiple photolithography and multiple corrosions (dry or wet) on the substrate by binary optical technology to prepare stepped microstructures on various materials such as quartz. This ...

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Application Information

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IPC IPC(8): G02B5/08G03F7/00G02B1/10G02B1/14
Inventor 梁静秋王波梁中翥徐大伟
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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