Method and apparatus for preparing high-pure carbon tetrafluoride gas

A high-purity carbon tetrafluoride and carbon tetrafluoride technology, which is applied in the direction of fluoride preparation, can solve the problems of severe equipment corrosion, expensive raw materials, low product purity and yield, and achieve equipment operation safety and gas purity. High, simple equipment effect

Active Publication Date: 2008-11-05
RES INST OF PHYSICAL & CHEM ENG OF NUCLEAR IND
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  • Description
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Problems solved by technology

[0013] The advantages of the fluorocarbon synthesis reaction method are that the raw materials are easy to obtain, the reaction is controllable, and the product purity is high. The disadvantage is that halogen fluoride is used as the explosion suppressant
[0014] In a word, there are many defects in the above method in use, mainly in: the reaction is mostly carried out at high temperature, it is prone to explosion, and the equipment is seriously corroded, the raw material is expensive, the energy consumption is large, and the product purity and yield are low

Method used

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  • Method and apparatus for preparing high-pure carbon tetrafluoride gas

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Effect test

Embodiment 1

[0070] After adding 60 kg of high-purity activated carbon (carbon content of 93%) into the reactor 4, the reactor 4 is preheated to 155°C, and the pressure of the fluorine gas storage tank 1 is -0.01Mpa. Open the reactor 4 inlet valve 3, the fluorine gas enters the reactor 4 through the pipeline 2 and directly undergoes the synthesis reaction with high-purity activated carbon, and the reaction product is carbon tetrafluoride gas containing impurities.

[0071] Analyze the composition of the outlet gas of the reactor 4, the main component is carbon tetrafluoride (CF 4 ) Gas with a small amount of hydrogen (H 2 ), oxygen (O 2 ), nitrogen (N 2 ), fluorine gas (F 2 ), silicon tetrafluoride (SiF 4 ), hexafluoroethane (C 2 F 6 ), octafluoropropane (C 3 F 8 ), carbon dioxide (CO 2 ).

[0072] The carbon tetrafluoride gas containing impurities is passed through the dust collector 5 to remove solid matter. The operating pressure of the dust collector 5 is -0.020Mpa; the carbon tetrafluorid...

Embodiment 2

[0078] After adding 64 kg of high-purity activated carbon (95% carbon content) into the reactor 4, the reactor 4 is preheated to 162°C, and the pressure of the fluorine gas storage tank 1 is -0.008Mpa. Open the reactor 4 inlet valve 3, the fluorine gas enters the reactor 4 through the pipeline 2 and directly undergoes the synthesis reaction with high-purity activated carbon, and the reaction product is carbon tetrafluoride gas containing impurities.

[0079] Analyze the composition of the outlet gas of the reactor 4, the main component is carbon tetrafluoride (CF 4 ) Gas, and the gas contains a small amount of hydrogen (H 2 ), oxygen (O 2 ), nitrogen (N 2 ), fluorine gas (F 2 ), silicon tetrafluoride (SiF 4 ), hexafluoroethane (C 2 F 6 ), octafluoropropane (C 3 F 8 ), carbon dioxide (CO 2 ).

[0080] The carbon tetrafluoride gas containing impurities is removed by the dust collector 5, and the operating pressure of the dust collector 5 is -0.018Mpa; the carbon tetrafluoride gas fr...

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Abstract

The invention discloses a method and equipment for producing highly purity carbon tetrafluoride gas; the method includes the steps: the fluorine gas and highly purity active carbon successively experience the chemical synthesis reaction, dedusting, water washing, alkaline washing, gas liquid separation, water removal, rectification, liquefaction and collection. The equipment includes a fluorine gas storage tank, a reaction kettle, a dust catcher, a water scrubber, an alkaline tower, a gas-liquid separator, an absorption column, a rectifying still, a rectifying column and a condenser. The carbon tetrafluoride gas produced with the method and equipment has high purity and the invention has the advantages of simple equipment, easy operation, convenient and safe operation, continuous production and so on.

Description

Technical field [0001] The invention belongs to a method and equipment for preparing fluoride gas, in particular to a method and equipment for preparing high-purity carbon tetrafluoride gas by using fluorine gas and high-purity activated carbon as raw materials. Background technique [0002] Carbon tetrafluoride is the largest plasma etching gas used in the microelectronics industry. It is widely used in the etching of thin-film materials such as silicon, silicon dioxide, silicon nitride, phosphosilicate glass, and tungsten, as well as cleaning the surface of electronic devices and solar cells. There are also a large number of applications in production, laser technology, low temperature refrigeration, gas insulation, leak detection agents, detergents, lubricants and brake fluids in printed circuit production. [0003] There are many methods for preparing carbon tetrafluoride gas, mainly including electrolysis, fluorochloromethane fluorination, hydrofluoromethane fluorination, an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B9/08
Inventor 陈光华倪志强
Owner RES INST OF PHYSICAL & CHEM ENG OF NUCLEAR IND
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