Process for producing low-dielectric loss cyanate resin
A cyanate resin, low dielectric technology, applied in the field of preparation of low dielectric loss cyanate resin, can solve the problems of cyanate resin dielectric performance improvement, dielectric constant and dielectric loss factor increase, etc. Achieve the effects of improving mechanical properties, reducing dielectric constant and dielectric loss, and improving heat resistance
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Embodiment 1
[0020] Prepare according to the following formula
[0021] 95 parts by mass of bisphenol A type cyanate resin
[0022] Hollow glass microspheres (10-100 μm) 5 parts by mass
[0023] KH-560 0.25 parts by mass
[0024] 0.03 parts by mass of dibutyltin dilaurate
[0025] Put the hollow glass microspheres in a blast drying oven, and dry them at 80°C to 90°C for 1 hour; heat the bisphenol A cyanate resin monomer above the melting point to make it into a liquid state, and add silane to couple Agent KH-560 and dried hollow glass microspheres were mixed and stirred for 3 hours at 130°C to 145°C until the silane coupling agent diffused well and coupled on the surface of hollow glass microspheres; Dibutyltin dilaurate, stirred and dissolved, poured into a glass mold coated with a release agent, and cured in an electronic oven at 160°C / 2h+180°C / 2h+200°C / 2hr+220°C / 2h , and then post-treatment, the post-treatment temperature is 240 ° C, the time is 2 hours. The properties of the modif...
Embodiment 2
[0027] Prepare according to the following formula
[0028] 90 parts by mass of bisphenol A type cyanate resin
[0029] Hollow glass microspheres (10-100 μm) 10 parts by mass
[0030] KH-570 0.5 parts by mass
[0031] Di-n-octyltin dilaurate 0.03 parts by mass
[0032] Put the hollow glass microspheres in a blast drying oven, and dry them at 80°C to 90°C for 1 hour; heat the bisphenol A cyanate resin monomer above the melting point to make it into a liquid state, and add silane to couple Agent KH-570 and dried hollow glass microspheres were mixed and stirred for 3 hours at 130°C to 145°C until the silane coupling agent diffused well and coupled on the surface of hollow glass microspheres; Di-n-octyltin dilaurate, stirred and dissolved, poured into a glass mold coated with a release agent in advance, and carried out in an electronic oven according to the process of 160°C / 2h+180°C / 2h+200°C / 2hr+220°C / 2h Curing, and then post-processing, the post-processing temperature is 240 °...
Embodiment 3
[0034] Prepare according to the following formula
[0035] 85 parts by mass of bisphenol A type cyanate resin
[0036] Hollow glass microspheres (10-100 μm) 15 parts by mass
[0037] KH-560 / KH570 (1:1) 1 part by mass
[0038] Dibutyltin dilaurate / Di-n-octyltin dilaurate (2:1) 0.03 parts by mass
[0039] Put the hollow glass microspheres in a blast drying oven, and dry them at 80°C to 90°C for 1 hour; heat the bisphenol A cyanate resin monomer above the melting point to make it into a liquid state, and add silane to couple The mixture of agent KH560 / KH-570 (1:1) and the dried hollow glass microspheres were mixed and stirred at 130℃~145℃ for 3 hours until the silane coupling agent diffused well and coupled on the surface of the hollow glass microspheres. Link; add di-n-octyltin dilaurate / di-n-octyltin dilaurate (2:1) mixture to the above mixing system, stir to dissolve, pour into a glass mold pre-coated with a release agent, press 160 in an electronic oven °C / 2h+180°C / 2h+200...
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