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Method of fabricating an alumina nanohole array, and method of manufacturing a magnetic recording medium

A kind of technology of alumina nanometer and manufacturing method, which is applied in the field of manufacturing alumina nanohole array, which can solve the problems of shortening the life of die or mold

Inactive Publication Date: 2009-06-10
FUJI ELECTRIC DEVICE TECH CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Thus there is a tendency to wear or damage the metal protrusions, predicting a shortened die or die life

Method used

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  • Method of fabricating an alumina nanohole array, and method of manufacturing a magnetic recording medium
  • Method of fabricating an alumina nanohole array, and method of manufacturing a magnetic recording medium
  • Method of fabricating an alumina nanohole array, and method of manufacturing a magnetic recording medium

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0096] Aluminum film production

[0097] The aluminum thin films used in the following examples were produced as follows.

[0098] In a sputtering apparatus having a substrate mounting stage equipped with a temperature control system consisting of a liquid nitrogen feeder and a heating mechanism, a 2.5-inch monocrystalline silicon substrate was mounted on the substrate stage, and placed on various substrates Film formation is performed at a temperature. The aluminum target used for film formation had a diameter of 6 inches and a purity of 99.99%. The film formation conditions were set to a film formation time of 60 seconds and an aluminum film thickness of 100 nm.

[0099] FIG. 2 shows the measurement results of the maximum surface roughness (Rmax) of aluminum thin films produced at substrate temperatures ranging from -196°C (liquid nitrogen temperature) to 40°C. At a substrate temperature of -80°C or lower, Rmax is about 3 nm, from which it can be found that it is possible...

example 2

[0102] Correlation between Vickers Hardness of Aluminum Thin Film and Substrate Temperature

[0103] Under the conditions shown in Example 1, for a pure aluminum thin film (example according to the present invention) with a film thickness of 100 nm produced at a substrate temperature of -196°C and to use Al-Mg (8 wt% Mg) The Vickers hardness and The temperature dependence was studied. The results are shown in FIG. 3 .

[0104] The Vickers hardness was found to be substantially constant independent of the substrate temperature. In the thin film obtained in the example of the present invention using pure aluminum, the Vickers hardness was about 0.78 GPa. In contrast, in the thin film obtained in the comparative example using the Al-Mg alloy (8 wt% Mg), the Vickers hardness was 3.1 GPa, four times that of the thin film made of pure aluminum. Also, in the latter case, the Vickers hardness does not substantially change with the substrate temperature.

[0105] These results dem...

example 3

[0108] Correlation of Vickers Hardness of Aluminum Thin Films with Pit Formation (Texture Formation) Temperature

[0109] Correlation of Vickers hardness with pit formation (texturing) temperature for films produced according to the present invention using pure aluminum in Example 2, and for films produced using Al-Mg (8 wt% magnesium) alloy according to Comparative Example gender research. The results are shown in FIG. 4 .

[0110] In the Al-Mg thin film, the Vickers hardness does not decrease even when the temperature is raised to 200°C. In contrast, when an aluminum thin film is produced from pure aluminum at a substrate temperature of -196°C according to the present invention, the Vickers hardness suddenly decreases at 100°C or higher, and becomes room temperature Vickers at a temperature of 150°C to 200°C. About 50% of the hardness value.

[0111] Based on this data, when the molding was performed while maintaining the dimple-forming stamper and a pure aluminum film wi...

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Abstract

The invention provides a method of fabricating the alumina nanohole formed by aluminum thin-film with improved surface smoothness, preferably a method of fabricating the alumina nanohole array capable of reducing pressure used for pit formation for forming alumina nanohole and a method of fabricating magnetic recording medium by using the alumina nanohole. The alumina nanohole array is fabricated by forming an aluminum thin-film on a substrate at a substrate temperature of -80 DEG C. or below, or using the mold to cause the aluminum thin-film to have structure before anodic oxidation and the mold and the aluminum thin-film are held at a temperature of 150 to 200 DEG.

Description

technical field [0001] The present invention relates to a method of manufacturing an aluminum thin film that can be used to construct various nanodevices including magnetic recording media constructed into various magnetic recording devices such as external storage devices of computers. The present invention additionally relates to a method of making an array of aluminum oxide nanoholes, and a method of using the aluminum thin film produced thereby to make a magnetic recording medium. Background technique [0002] Accompanying the recent trend for high-density storage in magnetic disks has been a shift in magnetic recording methods from conventional in-plane recording (longitudinal recording) to perpendicular recording. The development of perpendicular recording methods has significantly improved recording density. When using in-plane recording, the upper limit of the recording density is about 100 gigabits per square inch (GB / in 2 ), and today's recording density has exce...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D11/04G11B5/84
CPCG11B5/855B82Y10/00C25D11/18G11B5/82C25D11/045G11B5/743G11B5/858C25D11/16C25D11/04B82Y40/00G11B5/84
Inventor 津田孝一
Owner FUJI ELECTRIC DEVICE TECH CO
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