Method for preparing semiconductor nanometer compound film
A nano-composite, semiconductor technology, applied in semiconductor/solid-state device manufacturing, semiconductor device, final product manufacturing and other directions, can solve the problems of uneven dispersion of cadmium sulfide, influence of film quality, colloidal coagulation, etc., to achieve low cost and preparation technology. Simple, simple ingredients
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Embodiment 1
[0027] Take 0.1g Cd[S 2 P(OC 4 h 9 ) 2 ] 2 , it was ultrasonically dispersed in 5g of N,N-dimethylformamide, and it was a light yellow transparent solution;
[0028] Disperse 113.45 g of tetrabutyl titanate in 176 g of ethanol, and add 16.7 g of acetylacetone as a stabilizer, and after fully stirring, a light yellow completely transparent solution I is obtained; respectively dissolve 4.2 g of concentrated nitric acid and 12.13 g of three times water In 100g of ethanol, after fully stirring, a colorless and transparent solution II was obtained; finally, under the state of strong magnetic stirring, the solution II was added dropwise to the solution I, and the color of the solution I quickly changed from light yellow to yellow or orange , finally turned into a transparent orange color and stopped, and continued to stir for 3 hours to ensure that the reaction was sufficient.
[0029] Weigh 21.13g of titanium dioxide sol, add the prepared Cd[S 2 P(OC 4 h 9 ) 2 ] 2 The dis...
Embodiment 2
[0032] The preparation of the composite sol is the same as in Example 1.
[0033] The dipping-pulling method is used to coat the film, the vertical pulling speed is 42.4cm / min, the ambient temperature is 25°C, and the relative humidity is 45-55%. The coated film was incubated in the air at 80°C for 30min, and then in N 2Under the atmosphere, the temperature was raised to 400°C for 2 hours at a rate of 10°C / min for sintering, and finally cooled naturally to room temperature. The obtained composite film is light yellow transparent film.
Embodiment 3
[0035] The preparation of the composite sol is the same as in Example 1.
[0036] The dipping-pulling method is used to coat the film, the vertical pulling speed is 42.4cm / min, the ambient temperature is 25°C, and the relative humidity is 45-55%. The coated film was incubated in the air at 80°C for 30min, and then in N 2 Under the atmosphere, the temperature was raised to 600°C at a rate of 10°C / min for sintering for 2 hours, and finally cooled to room temperature naturally. The obtained composite film is light yellow transparent film.
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