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Method for manufacturing application substrate through photo-thermal effect

A photothermal effect and substrate technology, which is applied in printed circuit manufacturing, nanostructure manufacturing, electrical components, etc., can solve the problems of high cost, inability to produce large areas and large quantities, and complex processes, and achieve low cost, easy large area and large quantities. The effect of making and the overall process is simple

Active Publication Date: 2009-09-02
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the present invention is to provide a method for making an application substrate by using the photothermal effect, so as to solve the problems existing in the prior art that the process is complicated, the cost is high, and it cannot be produced in a large area and in large quantities.

Method used

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  • Method for manufacturing application substrate through photo-thermal effect
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  • Method for manufacturing application substrate through photo-thermal effect

Examples

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Effect test

example 1

[0095] Taking gold nanoparticles as an example, gold nanoparticles with a particle diameter of about 20 nm are fixed on a transparent substrate, and then placed on the surface of a polymer material plate. The gold nanoparticles will contact the surface of the plate. A green laser with a wavelength of 532nm is irradiated on the gold nanoparticles through the transparent substrate for about 15 seconds (the irradiation time is related to the material of the nanoparticles, the size of the nanoparticles, the concentration of the nanoparticles, the type of laser, the intensity of the laser, etc.) to excite the gold nanoparticles on the plate. of gold nanoparticles. At this time, the gold nanoparticles can generate heat energy up to about 200° C. within 15 seconds of the green laser irradiation. After the green laser irradiation is completed, the transparent substrate and gold nanoparticles on the plate are removed to obtain an application substrate with fine holes. Here, using an ...

example 2

[0099] A green laser with a wavelength of 532nm and a power of 100mW (milliwatts) is used to irradiate the gold nanoparticles placed on the plate 1 through the transparent substrate for about 10 minutes (irradiation time depends on the material of the nanoparticles, the size of the nanoparticles, the concentration of the nanoparticles, Laser type, laser intensity and other factors), and after the irradiation is completed, the transparent substrate and gold nanoparticles are removed to obtain the application substrate 1 . Here, using an atomic force microscope to observe the plate with gold nanoparticles before the green laser irradiation and the applied substrate 1 obtained after the laser irradiation, the following can be observed respectively: Figure 11A and Figure 11B Surface state shown.

example 3

[0101]A green laser with a wavelength of 514.5nm and a power of 1W (watts) was used to irradiate the gold nanoparticles on the plate 2 through the transparent substrate for about 20 minutes, and after the irradiation was completed, the transparent substrate and the gold nanoparticles were removed to obtain the application substrate 2 . Here, using an atomic force microscope to observe the plate with gold nanoparticles before irradiating the green laser and the applied substrate 2 obtained after the laser irradiating, the following can be observed respectively: Figure 12A and Figure 12B Surface state shown.

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Abstract

The invention discloses a method for manufacturing an application substrate through photo-thermal effect, which comprises the following steps: performing light excitation on nanoparticles, and then converting light energy supplied by irradiation light rays into heat energy to further form a structure through the generated heat energy by which the application substrate with a specific surface structure is generated.

Description

technical field [0001] The invention relates to a method for manufacturing a substrate with a specific surface structure, in particular to a method for manufacturing an application substrate by utilizing photothermal effects. Background technique [0002] At present, the main methods for producing relatively precise or regular surface micro / nano structures include photolithography and nano-imprinting lithography (NIL). Although optical lithography technology has been widely used in semiconductor processes, it has problems such as etching anisotropy and selectivity, and many important process parameters need to be considered in the process, such as: photomask The accuracy of the mold, the etching rate and the uniformity, etc., generally speaking, the process is relatively complicated, and moreover, the cost is relatively high. As far as nano-imprint technology is concerned, although nano-scale structures can be produced by using nano-imprint technology, and there is a direct...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B82B3/00H05K3/00
Inventor 李宗铭汪若蕙邱国展王裕铭郑伊廷
Owner IND TECH RES INST
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