Integrated optoelectronic device based on sideband injection locking and used for generating high-frequency microwaves
An optoelectronic device, injection locking technology, applied in laser parts, lasers, electrical components and other directions, can solve the problems of large and complex system, poor stability, high cost, and achieve the effect of simple manufacturing process, low cost and high yield
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Embodiment 1
[0049] Example 1 figure 2 It is a Y-branch waveguide coupled photo-generated microwave integrated optoelectronic device that integrates two slave lasers. The operating wavelength is in the 1550nm band, and on the basis of using an external discrete tunable laser and an external modulator for injection, the InGaAsP / InP-based integrated optoelectronic device that generates high-frequency microwaves is locked by sideband injection.
[0050] This device integrates two DFB lasers 21a as slave lasers 22 and a Y-branch waveguide 23 on one chip.
[0051] First, the epitaxial materials of the device are as follows. By metal organic chemical vapor deposition (Metal Organic Chemical Vapor Deposition, MOCVD) method, first epitaxy on the n-type substrate 10 material, and then grow the n-type InP lower cladding layer 10 (thickness 200nm, doping concentration about 1×10 18 cm -2), 100nm thick undoped lattice-matched InGaAsP waveguide layer 11 (photoluminescence wavelength 1.2μm), straine...
Embodiment 2
[0054] Example 2 Figure 4 It is an MMI coupled photo-generated microwave integrated optoelectronic device that integrates two slave lasers. The operating wavelength is in the 1550nm band, and on the basis of using an external discrete tunable laser and an external modulator for injection, the InGaAsP / InP-based integrated optoelectronic device that generates high-frequency microwaves is locked by sideband injection.
[0055] This device integrates two DFB lasers 21a as slave lasers 22 and one MMI 25 on one chip.
[0056] First, the epitaxial materials of the device are as follows. Through the MOCVD method, first epitaxially grow the n-type InP lower cladding layer 10 (thickness 200nm, doping concentration about 1×10) on the n-type substrate 10 material 18 cm -2 ), 100nm thick undoped lattice-matched InGaAsP waveguide layer 11 (photoluminescence wavelength 1.2μm), strained InGaAsP multiple quantum wells 12 (photoluminescence wavelength 1.52μm, 7 quantum wells: well width 8nm...
Embodiment 3
[0059] Example 3 Image 6 It is a Y-branch waveguide coupled photo-generated microwave integrated optoelectronic device that integrates a master laser and two slave lasers. The operating wavelength is within the 1550nm band, and on the basis of direct modulation of the main laser, the InGaAsP / InP-based integrated optoelectronic device that uses sideband injection locking to generate high-frequency microwaves.
[0060] This device integrates two DFB lasers 21 a as slave lasers 22 , one DFB laser 21 b as master laser 26 and two Y-branch waveguides 23 on one chip.
[0061] First, the epitaxial materials of the device are as follows. Through the MOCVD method, first epitaxially grow the n-type InP lower cladding layer 10 (thickness 200nm, doping concentration about 1×10) on the n-type substrate 10 material 18 cm -2 ), 100nm thick undoped lattice-matched InGaAsP waveguide layer 11 (photoluminescence wavelength 1.2μm), strained InGaAsP multiple quantum wells 12 (photoluminescence ...
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