Method for preparing manganese-stabilized zirconia film
A technology for stabilizing zirconia and thin films, which is applied in the field of preparation of manganese-stabilized zirconia thin films, can solve problems such as the easy occurrence of second-phase oxides, eliminate the formation of amorphous layers and second-phase oxides, and achieve rapid preparation Effect
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[0015] Example 1
[0016] ZrO 2 Powder and MnO 2 The powder is the raw material, weigh, mix and grind for 2h according to the molar ratio of Zr:Mn of 3:1, then take it out after 12-24 hours of constant temperature treatment at 1400℃, and then carefully grind for 2h, mix well, weigh 5g a portion , Using a hard steel mold on the tablet press, use a pressure of 10 MPa to form a disk-shaped sample with a diameter of 20 mm and a thickness of 2 mm. The sample is placed in a corundum crucible and placed in a high-temperature furnace with a silicon-carbon tube heating element. In an argon environment, it is sintered at a temperature of 1400°C for 12-24 hours and then cooled to room temperature with the furnace to obtain Zr. 0.75 Mn 0.25 O 2 Stabilize the zirconia block material, and prepare the target material after grinding the block material. Then use pulsed laser deposition technology to prepare manganese stabilized zirconia film. The laser used in the experiment is the COMPex205 KrF e...
Example Embodiment
[0017] Example 2
[0018] ZrO 2 Powder and MnO 2 The powder is the raw material, weigh, mix and grind for 2h according to the molar ratio of Zr:Mn of 3:1, then take it out after 12-24 hours of constant temperature treatment at 1400℃, and then carefully grind for 2h, mix well, weigh 5g a portion , Using a hard steel mold on the tablet press, use a pressure of 10 MPa to form a disk-shaped sample with a diameter of 20 mm and a thickness of 2 mm. The sample is placed in a corundum crucible and placed in a high-temperature furnace with a silicon-carbon tube heating element. In an argon environment, it is sintered at a temperature of 1400°C for 12-24 hours and then cooled to room temperature with the furnace to obtain Zr. 0.75 Mn 0.25 O 2 Stabilize the zirconia block material, and prepare the target material after grinding the block material. Then use pulsed laser deposition technology to prepare manganese stabilized zirconia film. The laser used in the experiment is the COMPex205 KrF e...
Example Embodiment
[0019] Example 3
[0020] ZrO 2 Powder and MnO 2 The powder is the raw material, weigh, mix and grind for 2h according to the molar ratio of Zr:Mn of 3:1, then take it out after 12-24 hours of constant temperature treatment at 1400℃, and then carefully grind for 2h, mix well, weigh 5g a portion , Using a hard steel mold on the tablet press, use a pressure of 10 MPa to form a disk-shaped sample with a diameter of 20 mm and a thickness of 2 mm. The sample is placed in a corundum crucible and placed in a high-temperature furnace with a silicon-carbon tube heating element. In an argon environment, it is sintered at a temperature of 1400°C for 12-24 hours and then cooled to room temperature with the furnace to obtain Zr. 0.75 Mn 0.25 O 2 Stabilize the zirconia block material, and prepare the target material after grinding the block material. Then use pulsed laser deposition technology to prepare manganese stabilized zirconia film. The laser used in the experiment is the COMPex205 KrF e...
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