Method for manufacturing back aluminium diffused N type solar cell
A solar cell and N-type technology, which is applied in the manufacture of circuits, electrical components, and final products, can solve problems such as impact and battery efficiency reduction
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[0021] The following combination figure 1 The embodiments of the present invention are described in detail. The process flow of this embodiment is as follows:
[0022] 1) Put the N-type silicon wafer 1 with a resistivity of 0.2-15 ohm·cm into an ultrasonic cleaning machine for cleaning, and then add an appropriate amount of isopropanol and sodium silicate with 0.5% to 2% NaOH or KOH solution to corrode the surface 2. Then pickling, cleaning and drying;
[0023] 2) Put the textured N-type silicon wafer 1 into PECVD, and make a layer of 10-100nm silicon nitride isolation film 3 on the back;
[0024] 3) Put the N-type silicon wafer 1 into the phosphorus diffusion furnace, and diffuse a layer of square resistance R=20~60ohm phosphorus diffusion layer or N+ layer 4 on the front side;
[0025] 4) Use a plasma etching machine to remove the edge conductive layer 5;
[0026] 5) Use 2-10% hydrofluoric acid to remove the back silicon nitride isolation film 3 and the surface phosphosilicate glas...
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