Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching

A wet etching, semi-cylindrical technology, applied in the manufacture of microstructure devices, processes for producing decorative surface effects, coatings, etc., can solve the problem that the processing area is only on the order of microns and the cost is expensive, and achieve high efficiency Processing route, effect of reducing preparation cost

Inactive Publication Date: 2010-06-09
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although direct writing equipment such as electron beams and ion beams can produce patterns of this size, they are expensi

Method used

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  • Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching
  • Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching
  • Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching

Examples

Experimental program
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Example Embodiment

[0025] In Example 1, a semi-cylindrical micro groove with a diameter of 1 micron was produced, and the production process was as follows figure 1 As shown, the details are as follows:

[0026] (1) Choose a quartz plate with a thickness of 360 microns as the substrate; use magnetron sputtering technology to deposit a 100-nanometer-thick metal chromium layer on the surface of the substrate, and coat the chromium layer with AR-P3100 with a thickness of 1.1 microns Photoresist (such as figure 2 Shown).

[0027] (2) Through exposure, development, and hard mold, the photoresist is prepared as image 3 Line structure shown.

[0028] (3) such as Figure 4 As shown, the photoresist pattern is used for masking and the isotropic feature of wet etching, and the metal chromium layer under the edge of the photoresist line pattern is etched using an etching solution. The corrosive liquid is chromium-removing liquid, the ratio of which is 100ml water, 13ml perchloric acid, 50g tetraammonium nitrat...

Example Embodiment

[0031] Example 2 Fabrication of semi-cylindrical micro grooves with a diameter of 700 nanometers is as follows: figure 1 As shown, the details are as follows:

[0032] (1) Choose a quartz plate with a thickness of 1000 microns as the substrate; use magnetron sputtering technology to deposit a 50-nm-thick metal chromium layer on the surface of the substrate, and coat the chromium film with a thickness of 1.1 microns AR-P3100 Photoresist (such as figure 2 Shown).

[0033] (2) Through exposure, development, and hard mold, the photoresist is prepared as image 3 Line structure shown.

[0034] (3) such as Figure 4 As shown, the photoresist pattern is used for masking and the isotropic feature of wet etching, and the metal chromium layer under the edge of the photoresist line pattern is etched using an etching solution. The corrosive liquid is chromium removal liquid, the ratio is 100ml water, 13ml perchloric acid, 50g tetraammonium nitrate, the corrosion temperature is 23℃, the time fo...

Example Embodiment

[0037] Example 3 Fabrication of semi-cylindrical micro grooves with a diameter of 2 microns, the fabrication process is as follows figure 1 As shown, the details are as follows:

[0038] (1) Choose a quartz plate with a thickness of 1000 microns as the substrate; use magnetron sputtering technology to deposit a 150-nm-thick metal chromium layer on the surface of the substrate, and coat the chromium film with a thickness of 1.1 microns AR-P3100 Photoresist (such as figure 2 Shown).

[0039] (2) Through exposure, development, and hard mold, the photoresist is prepared as image 3 Line structure shown.

[0040] (3) such as Figure 4 As shown, the photoresist pattern is used for masking and the isotropic feature of wet etching, and the metal chromium layer under the edge of the photoresist line pattern is etched using an etching solution. The corrosive liquid is chromium-removing liquid, the ratio is 100ml water, 13ml perchloric acid, 50g tetraammonium nitrate, the corrosion temperatur...

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Abstract

The invention relates to a method for preparing a semicylindrical minute groove by utilizing two-time film deposition and wet etching, which comprises the following steps of: depositing a film on a quartz substrate by adopting a conventional technology, coating a photoresist on the film, photoetching, developing and firming a mould; using a photoresist graph for shielding and isotropical characteristics of wet etching and using an etching solution to etch the film below the edge of the photoresist graph to form an air gap with certain width; depositing the film made of the same material on the surface of a structure obtained after the wet etching again and removing the photoresist to obtain a slit having the same width with the air gap; and then utilizing the film for shielding and carrying out isotropical etching on the quartz substrate by using a hydrofluoric acid buffer solution through the slit to obtain the semicylindrical minute groove. The slit with the width range of 700 nanometers to 2.5 microns can be prepared by the method without expensive equipment of electron beams, particle beams, dry etching and the like, and then the semicylindrical minute groove with the diameter width range of 700 nanometers to 2.5 microns and the depth range of 350 nanometers to 1.25 microns is obtained through controlling the condition of the wet etching.

Description

technical field [0001] The invention relates to a method for preparing a semi-cylindrical micro-groove, in particular to a method for preparing a semi-cylindrical micro-groove by using two layers of film deposition and wet etching. technical background [0002] Micro / nano components, especially micro / nano optical components, have great application potential in scientific research, military, civil and other fields. The preparation of micron and submicron semi-cylindrical micro-grooves is a difficult research point. Semi-cylindrical micro-grooves are the basis for preparing micro / nano optical elements with complex structures. Semi-cylindrical micro-grooves have broad application prospects, for example, in super-resolution imaging, SPP nanolithography and other aspects. [0003] The preparation method of semi-cylindrical grooves is gray-scale exposure etching, which uses the different exposure doses of photoresists in different regions to make the structural pattern in the ex...

Claims

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Application Information

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IPC IPC(8): B81C1/00B82B3/00
Inventor 刘玲王长涛罗先刚冯沁刘尧刘凯鹏邢卉潘丽
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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