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Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching

A wet etching, semi-cylindrical technology, applied in the manufacture of microstructure devices, processes for producing decorative surface effects, coatings, etc., can solve the problem that the processing area is only on the order of microns and the cost is expensive, and achieve high efficiency Processing route, effect of reducing preparation cost

Inactive Publication Date: 2010-06-09
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although direct writing equipment such as electron beams and ion beams can produce patterns of this size, they are expensive and the processing area is only on the order of microns, which is difficult to meet the needs of practical applications

Method used

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  • Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching
  • Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching
  • Method for preparing semicylindrical minute groove by utilizing secondary film deposition and wet etching

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Embodiment 1, making the semi-cylindrical fine groove of diameter 1 micron, making process such as figure 1 As shown, the details are as follows:

[0026] (1) Select a quartz plate with a thickness of 360 microns as the substrate; use magnetron sputtering technology to deposit a layer of 100 nanometers thick metal chromium layer on the surface of the substrate, and coat AR-P3100 with a thickness of 1.1 microns on the chromium layer Photoresist (such as figure 2 shown).

[0027] (2) Through exposure, development, hard mold, prepare such as image 3 The line structure shown.

[0028] (3) if Figure 4 As shown, using the photoresist pattern as a mask and the isotropic characteristics of wet etching, the metal chromium layer below the edge of the photoresist line pattern is etched away by using an etching solution. The corrosion solution is a chrome removal solution, its proportion is 100ml of water, 13ml of perchloric acid, 50g of tetraammonium nitrate, the corrosion...

Embodiment 2

[0031] Embodiment 2 makes the semi-cylindrical micro-grooves with a diameter of 700 nanometers, and the manufacturing process is as follows figure 1 As shown, the details are as follows:

[0032] (1) Select a quartz plate with a thickness of 1000 microns as the substrate; use magnetron sputtering technology to deposit a layer of 50 nanometers thick metal chromium layer on the surface of the substrate, and coat AR-P3100 with a thickness of 1.1 microns on the chromium film Photoresist (such as figure 2 shown).

[0033] (2) Through exposure, development, hard mold, prepare such as image 3 The line structure shown.

[0034] (3) if Figure 4 As shown, using the photoresist pattern as a mask and the isotropic characteristics of wet etching, the metal chromium layer below the edge of the photoresist line pattern is etched away by using an etching solution. The corrosion solution is a chrome removal solution, the proportion of which is 100ml of water, 13ml of perchloric acid, 5...

Embodiment 3

[0037] Embodiment 3 makes the semi-cylindrical fine groove of diameter 2 microns, and manufacturing process is as follows figure 1 As shown, the details are as follows:

[0038] (1) Select a quartz plate with a thickness of 1000 microns as the substrate; use magnetron sputtering technology to deposit a layer of 150 nanometers thick metal chromium layer on the surface of the substrate, and coat AR-P3100 with a thickness of 1.1 microns on the chromium film Photoresist (such as figure 2 shown).

[0039] (2) Through exposure, development, hard mold, prepare such as image 3 The line structure shown.

[0040] (3) if Figure 4As shown, using the photoresist pattern as a mask and the isotropic characteristics of wet etching, the metal chromium layer below the edge of the photoresist line pattern is etched away by using an etching solution. The corrosion solution is a chrome removal solution, its proportion is 100ml of water, 13ml of perchloric acid, 50g of tetraammonium nitrate...

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Abstract

The invention relates to a method for preparing a semicylindrical minute groove by utilizing two-time film deposition and wet etching, which comprises the following steps of: depositing a film on a quartz substrate by adopting a conventional technology, coating a photoresist on the film, photoetching, developing and firming a mould; using a photoresist graph for shielding and isotropical characteristics of wet etching and using an etching solution to etch the film below the edge of the photoresist graph to form an air gap with certain width; depositing the film made of the same material on the surface of a structure obtained after the wet etching again and removing the photoresist to obtain a slit having the same width with the air gap; and then utilizing the film for shielding and carrying out isotropical etching on the quartz substrate by using a hydrofluoric acid buffer solution through the slit to obtain the semicylindrical minute groove. The slit with the width range of 700 nanometers to 2.5 microns can be prepared by the method without expensive equipment of electron beams, particle beams, dry etching and the like, and then the semicylindrical minute groove with the diameter width range of 700 nanometers to 2.5 microns and the depth range of 350 nanometers to 1.25 microns is obtained through controlling the condition of the wet etching.

Description

technical field [0001] The invention relates to a method for preparing a semi-cylindrical micro-groove, in particular to a method for preparing a semi-cylindrical micro-groove by using two layers of film deposition and wet etching. technical background [0002] Micro / nano components, especially micro / nano optical components, have great application potential in scientific research, military, civil and other fields. The preparation of micron and submicron semi-cylindrical micro-grooves is a difficult research point. Semi-cylindrical micro-grooves are the basis for preparing micro / nano optical elements with complex structures. Semi-cylindrical micro-grooves have broad application prospects, for example, in super-resolution imaging, SPP nanolithography and other aspects. [0003] The preparation method of semi-cylindrical grooves is gray-scale exposure etching, which uses the different exposure doses of photoresists in different regions to make the structural pattern in the ex...

Claims

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Application Information

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IPC IPC(8): B81C1/00B82B3/00
Inventor 刘玲王长涛罗先刚冯沁刘尧刘凯鹏邢卉潘丽
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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