Polishing solution for chemically mechanical polishing single-crystal magnesium oxide substrate

Abstract

The invention relates to a polishing solution for chemically mechanical polishing single-crystal magnesium oxide substrate, belonging to polishing solution used for chemically mechanical polishing, in particular to the field of the polishing solution for chemically mechanical polishing single-crystal magnesium oxide. The polishing solution has the pH value of 1.5-7.0 and comprises the components as follows by weight percent: 0.5-30% of grinding material, 0.0001-1% of inhibitor, 0.001-10% of complexing agent and balance deionized water, wherein the grinding material of the polishing solution has the grain diameter of 10-500nm and is selected from SiO2, ZrO2, Al2O3, TiO2, MgO or CeO2 hydrosol; the complexing agent of the polishing solution is selected from organic acid, organic acid salt, inorganic acid or inorganic acid salt which contains phosphorus oxygen double bonds; and the inhibitor of the polishing solution is selected from compound containing five-membered ring. The polishing solution has high material removing rate and low surface roughness of a polished sample, and ensures the polished sample not to have the defects of scratch, pits and the like on the surface; and furthermore, the polishing solution is simple and convenient for preparation and low in cost.

Description

technical field [0001] The invention belongs to a polishing liquid for chemical mechanical polishing, in particular to the field of polishing liquid for chemical mechanical polishing of a single crystal magnesium oxide substrate. Background technique [0002] At present, magnesium oxide substrate is one of the main substrate materials most commonly used for high-temperature superconducting thin films of high-frequency microwave devices, and it is also an important high-temperature superconducting thin-film substrate that can be industrialized at present. Studies have shown that the surface roughness and surface defects of the polished magnesium oxide substrate have a great influence on the morphology and properties of the deposited yttrium barium copper oxide (YBCO) film. The YBCO film deposited on the surface of magnesium oxide substrate with surface roughness less than 1nm and greater than 1.6nm, its critical current density Jc value will be different by 2 to 3 times; the ...

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to solve the existing complex polishing process, low polishing removal rate, difficult to obtain high-quality substrate surface, and high cost problems, thereby providing a high removal rate for single crystal magnesium oxide substrate polishing, Polishing fluid with small damage layer and low cost