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Photosensitive resin composition

A technology of photosensitive resin and composition, which is applied in the field of black matrix, gasket and color filter, and can solve the problems of substrate adhesion, resolution and developability that cannot be completely solved

Inactive Publication Date: 2010-08-04
NIPPON KAYAKU CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, none of these methods can fully address the adhesion to the substrate, resolution, and developability

Method used

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  • Photosensitive resin composition
  • Photosensitive resin composition
  • Photosensitive resin composition

Examples

Experimental program
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Effect test

Embodiment 1

[0057] 22% solution of 32 g of propylene glycol monomethyl ether acetate (hereinafter abbreviated as PGMEA) of methacrylic acid-benzyl methacrylate copolymer (mass ratio 20 / 80, weight average molecular weight 22000) as a binder polymer , 7 g of an acrylated product of dipentaerythritol with a hydroxyl value of 70 mgKOH / g as a photopolymerizable monomer, 1 g of Irgacyua-907 (manufactured by Chiba Specialty Chemical Caluses) as a photopolymerization initiator, 0.5 g of Kayakyua-DETX-S (manufactured by Nippon Chemical Corporation) Pharmaceutical preparation), 86g as the red pigment dispersion of pigment (weight ratio: C.I. Pigment Red 177 / C.I. Pigment Yellow 83 / dispersant / PGMEA=16 / 4 / 5 / 75) and 30g as the PGMEA of solvent mix, obtain the present invention Red negative photosensitive composition 1 .

Embodiment 2

[0063] 23g of PGMEA 22% solution of methacrylic acid-benzyl methacrylate copolymer (mass ratio 20 / 80, weight average molecular weight 22000) as binder polymer, 5g of photopolymerizable monomer as hydroxyl value 130mgKOH / g of dipentaerythritol acrylate, 1 g of ilgacyua OXE02 (1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone as a photopolymerization initiator - 1-(O-acetyl oxime), produced by Chiba Special Chemicals), 45g of PGMEA 22% solution of carbon black dispersion liquid as pigment and 34g of PGMEA as solvent were mixed to obtain the black negative photosensitive combination of the present invention Object 4.

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Abstract

The present invention provides a photosensitive resin composition, which takes the irrealizable high balancing character of the existing acrylate monomer to meet the sealing, resolution factor, developing character and light sensitivity with the substrate. A negative photosensitive resin composition for color filter, black matrix or spacer contains the dipentaerythritol acrylate with the hydroxyl value from 70mgKOH / g to 130mgKOH / g, represented the chemical formula (1), (in the formula (1), a and b are positive integers, a+b=6, 1<=a<=6, 0<=b<=5).

Description

technical field [0001] The present invention relates to a negative photosensitive resin composition, and more specifically, the present invention relates to a color filter (color filter), black matrix (black matrix) used in a color liquid crystal display, a color video camera, a color digital camera, electronic paper, etc. ) or a photosensitive resin composition used in the manufacture of a spacer, and a patterned color filter, black matrix, and spacer using the photosensitive resin composition. Background technique [0002] Color filters, black matrices, and spacers are required in liquid crystal display devices such as liquid crystal displays (LCDs) represented by notebook computers and liquid crystal televisions. Color filters are required for colorization of solid-state imaging devices (solid-state imaging pixels) represented by charge-coupled devices (CCD, CMOS) used as input devices in digital cameras, color copiers, and the like. [0003] The photosensitive resin com...

Claims

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Application Information

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IPC IPC(8): G03F7/027G03F7/033G02B1/04G02F1/1335H01L27/146H01L27/148
CPCG02F1/133514G02F1/136209G03F7/0007G03F7/032G03F7/0382Y10S430/106
Inventor 堀口尚文见增亮一元山庄司
Owner NIPPON KAYAKU CO LTD