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Preparation method of silicon nitride films of various colors of crystalline silicon solar cell

A solar cell, silicon nitride film technology, applied in circuits, electrical components, semiconductor devices, etc., can solve problems such as limiting the appearance diversity of solar cells, and achieve the effect of diversification and color realization

Active Publication Date: 2011-12-21
湖南红太阳新能源科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The cells produced by such a coating process appear blue in sunlight, which obviously limits the diversity of solar cell appearance.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] Embodiment 1: Select a resistivity of 0.2 ohm / cm-30 ohm / cm P-type monocrystalline silicon wafer, the crystal plane is (100), the process is as follows:

[0016] (1) Wafer pretreatment steps:

[0017] a. Remove surface damage of silicon wafer, form anti-reflection surface structure and chemical cleaning;

[0018] b. in POCL 3 Diffusion in the atmosphere;

[0019] c. Remove the PN node around the silicon wafer, and clean and remove the phosphorous silicon glass on the surface;

[0020] (2) Deposit a silicon nitride film on the diffusion surface of crystalline silicon by PECVD method, and the coating process is as follows:

[0021] Put the non-diffusion surface of the silicon wafer close to the graphite boat and put it into the furnace tube of the PECVD equipment, heat the furnace tube to a certain temperature, adjust the radio frequency power of the deposition, preheat for 2 minutes, and feed SiH according to the set volume flow ratio 4 and NH 3 , adjust the opening ...

Embodiment 2

[0029] Example 2: Deposition process of battery sheet in which the color of silicon nitride film is golden brown

[0030] Furnace tube heating temperature (substrate temperature): 200°C-400°C

[0031] Deposition RF power: 1000W-3500W

[0032] SiH 4 with NH 3 Volume flow ratio: 1:5-6 (ie SiH 4 : NH 3 =1:5-6)

[0033] Reaction chamber pressure: 130Pa-160Pa

[0034] Frequency of RF discharge: 30KHz-35KHz

[0035] Deposition time: 510 seconds -700 seconds

[0036] Other processing conditions, method, equipment are identical to embodiment 1.

Embodiment 3

[0037] Embodiment 3: Cell deposition process in which the silicon nitride film color is red

[0038] Furnace tube heating temperature (substrate temperature): 200°C-500°C

[0039] Deposition RF power: 2000W-3500W

[0040] SiH 4 with NH 3 Volume flow ratio: 1:6-8 (ie SiH 4 : NH 3 =1:6-8)

[0041] Reaction chamber pressure: 165Pa-180Pa

[0042] Frequency of RF discharge: 36KHz-45KHz

[0043] Deposition time: 710 seconds -750 seconds

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Abstract

The invention discloses a production method for realizing silicon nitride films of various colors of a crystalline silicon solar cell. The method uses common tubular PECVD equipment, adjusts SiH4 / NH3 flow ratio under established substrate temperature and radio frequency power, controls radio frequency discharge frequency, controls reaction chamber pressure intensity and deposition time and evenlydeposits the silicon nitride film of various colors on the silicon slice. The method is simple, is easy to realize, has no pollution and is suitable for industrialized production.

Description

technical field [0001] The invention relates to a production method of a crystalline silicon solar cell, in particular to a production method for realizing silicon nitride films of various colors in the crystalline silicon solar cell. Background technique [0002] At present, the basic process flow of mature commercially produced crystalline silicon solar cells is: removal of surface damage on the silicon surface, formation of anti-reflection surface structure and chemical cleaning → in POCL 3 Diffusion in the atmosphere → removal of peripheral PN nodes → surface passivation and deposition of anti-reflection layer → screen printing front and back electrodes and back surface field → sintering to form ohmic contact → test binning. This commercial production process of crystalline silicon solar cells has the characteristics of simple process, high degree of equipment automation, and easy large-scale production, thereby reducing costs and making crystalline silicon solar cells r...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 刘贤金周大良周小荣
Owner 湖南红太阳新能源科技有限公司