Photovoltaic glass plated with temperable anti-reflection film layer and manufacturing method thereof

A technology of anti-reflection film and photovoltaic glass, which is applied in the field of photovoltaic glass and its production, can solve the problem of anti-reflection film layer hardness, acid and alkali resistance, weather resistance or adhesion is not very high, can not withstand thermal shock, anti-reflection effect Weaken and other problems, to achieve the effect of high film adhesion, good hardness, and high power generation increment

Inactive Publication Date: 2010-12-08
和合科技集团有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] There are many patents in the field of anti-reflection film coating on the surface of glass for solar cell encapsulation, but it is generally required in the disclosed patents that the hard film temperature of the film layer (the temperature at which the film layer is firmly combined with the glass) should not exceed 550 ° C (publication number The invention patent of CN101308878A claims that the temperature range of hardening treatment is 150℃~550℃; in the invention patent with the publication number of CN100495734C, magnesium fluoride is used as a kind of anti-reflection material, and magnesium fluoride is mainly used in optical instrument lens And the coating of the optical filter, the claim does not include the hardening temperature, but the magnesium fluoride film layer is generally obtained by sputtering, and it is combined with the glass by van der Waals force, so it cannot withstand thermal shock above 500 °C; The drying temperature in the new patent implementation with the publication number CN201336311Y is 300°C-500°C; the invention patent with the publication number CN100412018C introduces a baking temperature of 300°C). The reason is that the coating film involved in the above patent In the l

Method used

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  • Photovoltaic glass plated with temperable anti-reflection film layer and manufacturing method thereof
  • Photovoltaic glass plated with temperable anti-reflection film layer and manufacturing method thereof
  • Photovoltaic glass plated with temperable anti-reflection film layer and manufacturing method thereof

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Experimental program
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Effect test

Embodiment 1

[0026] Such as figure 1 and figure 2As shown, a photovoltaic glass coated with a toughened anti-reflection coating. It includes a low-iron ultra-clear patterned glass substrate 1 and an anti-reflection film layer 4, the anti-reflection film layer 4 is coated on the suede surface 2 of the low-iron ultra-clear patterned glass substrate 1, and the anti-reflection film layer 4 The main component is silicon dioxide, and the thickness of the anti-reflection film layer 4 is 120nm. The production method of this glass is: use orthoethyl silicate (TEOS) as the precursor, ammonia water as the catalyst to make silica sol, and obtain an anti-reflection coating solution by diluting and adding stabilizers, binders, etc., wherein the raw materials And the ratio of the amount of catalyst substance: tetraethyl orthosilicate: water: ethanol: ammonia water = 1: 4: 80: 5; the amount of stabilizer added is 1 g per liter of coating solution; the amount of binder added is added per liter of coatin...

Embodiment 2

[0028] like figure 1 and figure 2 As shown, a photovoltaic glass coated with a toughened anti-reflection coating. It includes a low-iron ultra-clear patterned glass substrate 1 and an anti-reflection film layer 4, the anti-reflection film layer 4 is coated on the suede surface 2 of the low-iron ultra-clear patterned glass substrate 1, and the anti-reflection film layer 4 The main component is silicon dioxide, and the thickness of the anti-reflection film layer 4 is 150nm. The production method of this glass is: use orthoethyl silicate (TEOS) as a precursor, hydrochloric acid as a catalyst to prepare silica sol, and obtain an anti-reflection coating solution by diluting and adding stabilizers, binders, etc.; the raw materials And the amount ratio of catalyst substance: tetraethyl orthosilicate: water: ethanol: hydrochloric acid=1: 2: 30: 1; The addition amount of stabilizer is that every liter of coating solution adds 3g; The amount of binder addition is that every liter of ...

Embodiment 3

[0030] like figure 1 and figure 2 As shown, a photovoltaic glass coated with a toughened anti-reflection coating. It includes a low-iron ultra-clear patterned glass substrate 1 and an anti-reflection film layer 4, the anti-reflection film layer 4 is coated on the suede surface 2 of the low-iron ultra-clear patterned glass substrate 1, and the anti-reflection film layer 4 The main component is silicon dioxide, and the thickness of the anti-reflection film layer 4 is 180nm. The production method of this glass is: use orthoethyl silicate (TEOS) as a precursor, hydrochloric acid as a catalyst to prepare silica sol, and obtain an anti-reflection coating solution by diluting and adding stabilizers, binders, etc.; the raw materials And the amount ratio of catalyst substance: tetraethyl orthosilicate: water: ethanol: hydrochloric acid=1: 3: 50: 3; The addition amount of stabilizer is that every liter of coating solution adds 5g; The amount of binder addition is that every liter of ...

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Abstract

The invention relates to packaging glass for solar cells, in particular to photovoltaic glass plated with a temperable anti-reflection film layer and a manufacturing method thereof. The photovoltaic glass comprises a low-iron super white patterned glass substrate (1) and an anti-reflection film layer (4), wherein one side of the low-iron super white patterned glass substrate (1) is a textured surface (2), while the other side is a patterned surface (3); the anti-reflection film layer (4) is plated on the textured surface (2) of the low-iron super white patterned glass substrate (1); the anti-reflection film layer (4) is formed by coating anti-reflection coating film liquid on the textured surface (2) of the low-iron super white patterned glass substrate (1) and performing surface drying, heating, pre-curing and tempering in turn; and a nano-scale silicon dioxide film layer is formed on the textured surface (2) of the low-iron super white patterned glass substrate (1). The photovoltaic glass plated with the temperable anti-reflection film layer produced by the method has the characteristics of high power generation increment, high film layer hardness, high acid and alkali resistance, high weather resistance, great film layer adhesion and the like.

Description

technical field [0001] The invention relates to a packaging glass for solar cells, in particular to a photovoltaic glass coated with a temperable anti-reflection film layer and a manufacturing method thereof. Background technique [0002] As an environmentally friendly new energy source, crystalline silicon solar cells have a very good development prospect. Since crystalline silicon cannot be exposed to the external environment for a long time, photovoltaic glass is currently one of the best packaging materials for protecting crystalline silicon and having a high light transmittance. The factors that determine the performance of crystalline silicon solar photovoltaic cells are related to light energy conversion efficiency. Among the various variables involved, the most important determinant is the crystalline silicon technology in photovoltaic components, followed by the photovoltaic glass used to protect photovoltaic components. It is far easier to improve the optical prop...

Claims

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Application Information

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IPC IPC(8): C03C17/23
Inventor 夏卫文王德标赵建杨
Owner 和合科技集团有限公司
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