Photovoltaic glass plated with temperable anti-reflection film layer and manufacturing method thereof
A technology of anti-reflection film and photovoltaic glass, which is applied in the field of photovoltaic glass and its production, can solve the problem of anti-reflection film layer hardness, acid and alkali resistance, weather resistance or adhesion is not very high, can not withstand thermal shock, anti-reflection effect Weaken and other problems, to achieve the effect of high film adhesion, good hardness, and high power generation increment
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0026] Such as figure 1 and figure 2As shown, a photovoltaic glass coated with a toughened anti-reflection coating. It includes a low-iron ultra-clear patterned glass substrate 1 and an anti-reflection film layer 4, the anti-reflection film layer 4 is coated on the suede surface 2 of the low-iron ultra-clear patterned glass substrate 1, and the anti-reflection film layer 4 The main component is silicon dioxide, and the thickness of the anti-reflection film layer 4 is 120nm. The production method of this glass is: use orthoethyl silicate (TEOS) as the precursor, ammonia water as the catalyst to make silica sol, and obtain an anti-reflection coating solution by diluting and adding stabilizers, binders, etc., wherein the raw materials And the ratio of the amount of catalyst substance: tetraethyl orthosilicate: water: ethanol: ammonia water = 1: 4: 80: 5; the amount of stabilizer added is 1 g per liter of coating solution; the amount of binder added is added per liter of coatin...
Embodiment 2
[0028] like figure 1 and figure 2 As shown, a photovoltaic glass coated with a toughened anti-reflection coating. It includes a low-iron ultra-clear patterned glass substrate 1 and an anti-reflection film layer 4, the anti-reflection film layer 4 is coated on the suede surface 2 of the low-iron ultra-clear patterned glass substrate 1, and the anti-reflection film layer 4 The main component is silicon dioxide, and the thickness of the anti-reflection film layer 4 is 150nm. The production method of this glass is: use orthoethyl silicate (TEOS) as a precursor, hydrochloric acid as a catalyst to prepare silica sol, and obtain an anti-reflection coating solution by diluting and adding stabilizers, binders, etc.; the raw materials And the amount ratio of catalyst substance: tetraethyl orthosilicate: water: ethanol: hydrochloric acid=1: 2: 30: 1; The addition amount of stabilizer is that every liter of coating solution adds 3g; The amount of binder addition is that every liter of ...
Embodiment 3
[0030] like figure 1 and figure 2 As shown, a photovoltaic glass coated with a toughened anti-reflection coating. It includes a low-iron ultra-clear patterned glass substrate 1 and an anti-reflection film layer 4, the anti-reflection film layer 4 is coated on the suede surface 2 of the low-iron ultra-clear patterned glass substrate 1, and the anti-reflection film layer 4 The main component is silicon dioxide, and the thickness of the anti-reflection film layer 4 is 180nm. The production method of this glass is: use orthoethyl silicate (TEOS) as a precursor, hydrochloric acid as a catalyst to prepare silica sol, and obtain an anti-reflection coating solution by diluting and adding stabilizers, binders, etc.; the raw materials And the amount ratio of catalyst substance: tetraethyl orthosilicate: water: ethanol: hydrochloric acid=1: 3: 50: 3; The addition amount of stabilizer is that every liter of coating solution adds 5g; The amount of binder addition is that every liter of ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com