Method for preparing silicon tetrafluoride and anhydrous hydrogen fluoride from sodium fluosilicate acidified by sulfuric acid
A technology of anhydrous hydrogen fluoride and silicon tetrafluoride, which is applied in the direction of fluorine/hydrogen fluoride, silicon halide compounds, halosilane, etc., can solve the problems of high cost, high energy consumption, complicated process, etc., and achieve low environmental load and high-efficiency utilization , high environmental benefits
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Embodiment 1
[0029] At a temperature of 100°C, add 100kg of sodium fluorosilicate and an excess of 20% sulfuric acid into the reactor and stir for 1 hour. The stirring rate is controlled at 200rpm and the concentration of sulfuric acid is 95%. Silicon tetrafluoride gas is obtained, and hydrogen fluoride remains in the solid residue. Among them, the decomposition rate is 49.7%, and the fluorine escaped into the gas phase accounts for 33.1% of the content of sodium fluorosilicate. Then the temperature was raised to 160°C, and hydrogen fluoride gas escaped. The two gases are strictly collected after dust removal, cooling, drying, refining and compression.
Embodiment 2
[0031] At 120°C, add 120kg of sodium fluorosilicate and an excess of 30% sulfuric acid into the reaction kettle for 1.2h, the stirring rate is controlled at 240rpm, and the concentration of sulfuric acid is 97%, to obtain silicon tetrafluoride gas, and hydrogen fluoride remains in the solid residue Among them, the decomposition rate is 56.9%, and the fluorine escaped into the gas phase accounts for 39.4% of the content of sodium fluorosilicate. Then the temperature was raised to 170°C, hydrogen fluoride gas escaped. The two gases are strictly collected after dust removal, cooling, drying, refining and compression.
Embodiment 3
[0033] At a temperature of 140°C, add 150kg of sodium fluorosilicate and excess 50% sulfuric acid into the reactor for 1.5h reaction, control the stirring rate at 300rpm, and sulfuric acid concentration of 98%, to obtain silicon tetrafluoride gas, and hydrogen fluoride remains in the solid residue Among them, the decomposition rate is 77.5%, and the fluorine escaped into the gas phase accounts for 51.2% of the content of sodium fluorosilicate. Then the temperature is raised to 180°C, and hydrogen fluoride gas escapes. The two gases are strictly collected after dust removal, cooling, drying, refining and compression.
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