Manufacturing method of inversed AlGaInP light emitting diode
A technology of aluminum gallium indium phosphide and light-emitting diodes, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of unstable process, complex process, and difficulty in accurately controlling the area of the light-emitting area, so as to improve process stability and simplify The effect of craft
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[0025] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0026] A method for manufacturing a flip-chip aluminum gallium indium phosphide light-emitting diode, the process steps are as follows: Figure 3a As shown, GaAs buffer layer 302, GaInP cut-off layer 303, GaAs ohmic contact layer 304, n-AlGaInP confinement layer 305, The epitaxial light-emitting layer composed of multiple quantum well active layer 306, p-AlGaInP confinement layer 307 and p-GaP window layer 308; wherein: GaAs ohmic contact layer 304 is the second conductivity type ohmic contact layer, and n-AlGaInP confinement layer 305 is The second conductivity type confinement layer, the first conductivity type confinement layer is the p-AlGaInP confinement layer 307, the p-GaP window layer 308 is the first conductivity type window layer; SiO is grown on the p-GaP window layer 308 2 In the dielectric layer 309, the photomask defines the scribe line p...
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