Method and device for pulse aperture injection batch preparation of even particles

A uniform and particle technology, applied in the industrial production field of high melting point particle preparation, can solve the problems of no obvious progress in the preparation of high melting point microparticles, unsuitable for industrial production, low production efficiency, etc., and achieves uniform size, consistent organization and low cost. Effect

Active Publication Date: 2011-03-02
DALIAN LONGTIAN TECH
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Problems solved by technology

However, the dispersion of the particles prepared by the atomization method is relatively wide, and the particles that can meet the requirements of use must be obtained through multiple screening and testing; the method of shredding or punching and remelting is not suitable for small particle size particles or materials with poor plastic processing It is more difficult, in addition, the prepared solder balls must be degreased; the uniform droplet forming method has

Method used

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  • Method and device for pulse aperture injection batch preparation of even particles
  • Method and device for pulse aperture injection batch preparation of even particles
  • Method and device for pulse aperture injection batch preparation of even particles

Examples

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Example Embodiment

[0027] Example 1 Batch preparation of uniform solidified particles of copper:

[0028] Devices such as figure 1 shown. First, the copper blocks are broken into massive particles with a particle size or an equivalent particle size of 2 cm, and are loaded into the crucible 23 with holes at the bottom. The holes are evenly distributed on the same circumference at the bottom of the crucible, such as figure 2 shown; the loading amount of copper particles reaches 1 / 4 of the capacity of the crucible 23, such as figure 1 Then, install the disk 21 made of graphite to the bottom of the crucible 23 with holes through four screws 22 evenly distributed, the diameter of the disk 21 is larger than the circle formed by the holes on the bottom of the crucible The diameter of the disc is provided with evenly distributed injection holes; the wetting angle of copper and graphite is 160°; manually adjust the position of the piston rod 2 until the distance between the piston rod 2 and the disc 2...

Example Embodiment

[0029] Example 2 Batch preparation of uniform solidified particles of silicon:

[0030] Devices such as figure 1 shown. First, the silicon block is broken into massive particles with a particle size or an equivalent particle size of 1 cm, and the broken small pieces are placed in the crucible 23 with holes at the bottom, and the holes are evenly distributed on the same circumference at the bottom of the crucible, such as figure 2 shown; the loading amount of silicon particles reaches 3 / 4 of the capacity of the crucible 23, such as figure 1Then, install the disk 21 made of graphite to the bottom of the crucible 23 with holes through four screws 22 evenly distributed, the diameter of the disk 21 is larger than the circle formed by the holes on the bottom of the crucible The diameter of the disc is provided with evenly distributed injection holes; the wetting angle of silicon and quartz is 95°; manually adjust the position of the piston rod 2 until the distance between the pis...

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Abstract

The invention relates to a method and device for the pulse aperture injection batch preparation of even particles. A heater is used to melt high melting -point material in a porous crucible on the bottom, and a pulse signal with certain waveform is input to piezoelectric ceramics; the piezoelectric ceramics drives a piston rod to move downwards to extrude fusant; the fusant injects drops from a plurality of injection apertures arranged on a disk; and drops are condensed in an annular landing tube to form even particles. The invention has the outstanding characteristics that even particles with even size, coincident tissue, good sphericity, controllable size and capability of meeting requirements can be prepared in bulk according to the invention. The invention has the characteristics of high efficiency, simple device, low cost and the like and is suitable for industrial production.

Description

technical field [0001] The invention belongs to the technical field of industrial production for the preparation of high-melting point particles, and in particular relates to a method and a device for batch-preparing uniform particles by pulse small hole jetting. Background technique [0002] With the continuous development of materials in the direction of light weight, miniaturization and integration, uniform spherical particle materials have received extensive attention and applications in electronic packaging, energy materials, and biomedical materials. Copper ball particles have good electrical properties, thermal properties, mechanical properties and economic advantages, so they are widely valued and are expected to become the main material in the next generation of electronic packaging technology; silicon ball particles can be used in solar panels, using silicon ball particles The solar cells produced can not only reduce the loss of raw materials in the traditional sil...

Claims

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Application Information

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IPC IPC(8): B01J13/02
Inventor 战丽姝董伟谭毅李国斌
Owner DALIAN LONGTIAN TECH
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