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Acrylate containing carboxyl hyperbranched poly(amine-ester) and preparation method thereof

A technology of monohydroxy acrylate and hyperbranched polymerization is applied in the synthesis field of photosensitive polymer materials, which can solve the problems of high shrinkage rate, poor alkali solubility and high viscosity of photoresist, and achieve low viscosity and increase alkali solubility. , high-resolution effects

Inactive Publication Date: 2011-03-30
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Technical problem: The purpose of this invention is to propose a kind of hyperbranched poly(amine-ester) acrylate containing carboxyl group for photoresist and its preparation method , to overcome the problems of high viscosity, large shrinkage and poor alkali solubility of the existing photoresist, so that it can be better applied to photoresist

Method used

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  • Acrylate containing carboxyl hyperbranched poly(amine-ester) and preparation method thereof
  • Acrylate containing carboxyl hyperbranched poly(amine-ester) and preparation method thereof
  • Acrylate containing carboxyl hyperbranched poly(amine-ester) and preparation method thereof

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Embodiment 1

[0020] The synthesis of the first generation of hyperbranched poly(amine-ester) mainly consists of the following three steps: First, add methyl acrylate (8.61g, 0.1mol) and diethanolamine (10.51g, 0.1mol) to a magnetic stirrer, In the three-necked flask at the inlet and outlet of the condenser and nitrogen, the reaction was carried out at 35°C for 4 hours with methanol as the solvent. After the reaction, the methanol was distilled off under reduced pressure to obtain methyl N,N-dihydroxyethyl-3-aminoacrylate. Secondly, dissolve pentaerythritol (2.72g, 0.02mol) in 20ml DMF, add N,N-dihydroxyethyl-3-aminoacrylate (15.29 g, 0.08mol) into the reaction vessel, and p-toluenesulfonic acid The catalyst was reacted at 120°C for 3 hours to distill off DMF under reduced pressure to obtain the first generation of hyperbranched poly(amine-ester). Finally, put the synthesized first-generation hyperbranched poly(amine-ester) into a vacuum drying oven to fully dry, remove the moisture, and di...

Embodiment 2

[0022] Dissolve the first generation hyperbranched poly(amine-ester) (7.72g, 0.01mol) in 20ml of DMAC, and add N,N-dihydroxyethyl-3-aminoacrylate (15.29g, 0.08mol) to In the reaction vessel, use p-toluenesulfonic acid as a catalyst to react at 120°C for 3 hours to distill off the solvent under reduced pressure to obtain the second generation hyperbranched poly(amine-ester). The dried second generation hyperbranched poly(amine-ester) ) Dissolve 1,4-dioxane, and slowly add the dissolved second-generation hyperbranched poly(amine-ester) to the ether solvent to make the second-generation hyperbranched poly(amine-ester) in the ether The collected precipitates are separated, and then washed three times with a mixed solution of ether / acetone (V / V=1:1), and the washed second-generation hyperbranched poly(amine-ester) is placed in a vacuum drying oven to remove Solvent to obtain purified second-generation hyperbranched poly(amine-ester), named HBP2.

Embodiment 3

[0024] The second-generation hyperbranched poly(amine-ester) (2.05g, 0.001mol) was dissolved in 20ml of NMP, and N,N-dihydroxyethyl-3-amino acrylate (3.06g, 0.016mol) was added to In the reaction vessel, use p-toluenesulfonic acid as a catalyst to react at 120°C for 3 hours to distill off NMP under reduced pressure to obtain the third-generation hyperbranched poly(amine-ester). The dried third-generation hyperbranched poly(amine-ester) ) Dissolve in 1,4-dioxane, and slowly add the dissolved third-generation hyperbranched poly(amine-ester) to the ether solvent to make the third-generation hyperbranched poly(amine-ester) in the ether The collected precipitates are separated, and then washed three times with a mixed solution of ether / acetone (V / V=1:1), and the washed third-generation hyperbranched poly(amine-ester) is placed in a vacuum drying oven to remove Solvent, obtain purified third-generation hyperbranched poly(amine-ester), named HBP3.

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Abstract

The invention discloses an acrylate containing carboxyl hyperbranched poly(amine-ester) used for a photoresist and a preparation method thereof, and is characterized in that hyperbranched poly(amine-ester) with different generations is synthesized through a step-by-step method by using polyalcohol and branched monomers, and then monohydroxy acrylate and diisocyanate react to obtain a semi-addition product; and the semi-addition product and maleic anhydride react with terminated hyperbranched poly(amine-ester) at a certain ratio to obtain the acrylate containing carboxyl hyperbranched poly(amine-ester). The synthesized product has the characteristics of low viscosity, good film forming performance and small contractibility rate of solidifying film and the like, has better alkali solubility for the addition of the carboxyl, and can obtain a clear image with higher resolution ratio, thereby better meeting the requirement when the synthesized product is used as a photoresist.

Description

technical field [0001] The invention relates to the synthesis of a photosensitive polymer material, in particular to a carboxyl-containing hyperbranched poly(amine-ester) acrylate used for photoresists and a preparation method thereof. Background technique [0002] Photoresist refers to an etching-resistant material whose solubility changes after exposure to light. It features fast cure, time saving and low solvent release. The preparation of photoresists has always been a research hotspot in the field of polymer materials, and it is the fastest growing technical field. At present, photoresists are mainly used in high-tech fields, such as integrated circuits and printed circuit boards, mobile communications and flat panel displays (LCD, PDP and OLED) and other electronic industries. Usually, unsaturated polyesters, epoxy resins, and urethane acrylates are the most important types of photoresists. Among them, urethane acrylate has good adhesion, abrasion resistance and oil...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G63/91C08G63/685G03F7/004
Inventor 林保平韩文松唐霁楠杨臻荣
Owner SOUTHEAST UNIV
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