Method for realizing self-cleaning by performing superhydrophobic modification treatment on surface of substrate

Abstract

The invention discloses a method for realizing self-cleaning by performing superhydrophobic modification treatment on the surface of a substrate, which comprises the following steps: 1) cleaning and drying an inorganic substrate, and placing the inorganic substrate at room temperature; 2) radiating the inorganic substrate treated by the step 1 with ultraviolet; and 3) preparing a superhydrophobic coating on the inorganic substrate to obtain a self-cleaning surface with superhydrophobic performance. When the substrate is a polymer substrate, a silane buffering layer is formed on the polymer substrate first before the step 2 and the step 3 are executed. The contact angle of water subjected to distillation for three times with the substrate surface prepared by the invention can reach 150 DEG, and the superhydrophobic coating can prevent pollution of impurities effectively and thus realize self-cleaning. The superhydrophobic coating has high stability.

Description

technical field [0001] The invention relates to a method for performing superhydrophobic modification treatment on the surfaces of metal oxides, polymers and metal substrates to realize self-cleaning. Background technique [0002] As an extreme case of wettability, superhydrophobic surfaces with a contact angle greater than 150° have attracted much attention for their potential advantages in self-cleaning materials, and have broad application prospects in national defense, industrial and agricultural production, and daily life. Based on the Wenzel and Cassie model, two conditions are required to obtain a superhydrophobic surface: low surface energy and high surface roughness. At home and abroad, a lot of research has been done on the preparation of superhydrophobic surfaces. The main methods are solidification of melt, etching, chemical vapor deposition, anodic oxidation and so on. However, these methods not only require relatively harsh experimental conditions, but also ha...

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Problems solved by technology

However, these methods not only require relatively harsh experimental conditions, but also have high costs, and are not conducive to large-scale industrial production, so their practical application is limited.

At the same time, these preparation methods have relatively high requirements on the substrate, such as requiring the substrate to withstand high temperature, conduct electricity, etc., which limit its wide application in actual production.

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