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Vanadium dioxide-doped powder and dispersion, and preparation method and application thereof

A technology of vanadium dioxide and dispersion liquid, applied in vanadium oxide, coating and other directions, can solve the problems of low deposition rate, expensive equipment, small film-forming area, etc., and achieve the effects of simple process, low cost and wide application

Inactive Publication Date: 2011-07-13
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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Problems solved by technology

[0005] When preparing vanadium dioxide thin films, commonly used methods include reactive sputtering, reactive evaporation, chemical vapor deposition, sol-gel method, pulsed laser ablation, etc., but these methods have the disadvantages of expensive equipment, complex process parameter control, and poor process stability. Or low deposition rate, small film forming area, not suitable for mass production and other limitations

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  • Vanadium dioxide-doped powder and dispersion, and preparation method and application thereof
  • Vanadium dioxide-doped powder and dispersion, and preparation method and application thereof
  • Vanadium dioxide-doped powder and dispersion, and preparation method and application thereof

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[0048] The preparation of the vanadium dioxide powder of the present invention can use a tetravalent vanadium ion aqueous solution as a reaction precursor, and treat the reaction precursor with an alkaline reagent.

[0049] The configuration of the tetravalent vanadium ion aqueous solution can be prepared by a method commonly used in this field: dissolve the tetravalent soluble vanadium raw material in an appropriate amount of water, preferably deionized water, and the suitable concentration can be 0.005-0.5mol / L, usually 0.01 mol / L L. Quaternary soluble vanadium salts can be commonly used cheap vanadium salts, such as vanadyl sulfate (VOSO 4 ) and vanadium oxychloride (VOCl 2 ). Of course, hydrates of vanadium salts, such as vanadyl oxalate anhydrate (VOC 2 o 4 .5H 2 o). The preparation of the tetravalent vanadium ion solution is usually carried out at normal temperature, but it is also understandable that a little heating or ultrasonication can be used to assist the di...

Embodiment 1

[0068] 1g VOSO 4 Dissolve the powder in 50ml deionized water, titrate with 1 mol / L NaOH solution, and keep stirring, and mix the suspension with 25mg Bi 2 o 3 Put them together into a 50ml hydrothermal kettle filled with 45ml deionized water, conduct a hydrothermal reaction at 250°C for 12 hours, and centrifuge and dry to obtain vanadium dioxide powder. After elemental analysis, its chemical formula is V 0.983 Bi 0.017 o 2 , the yield is 90%. Such as Figure 5 Its crystal phase is M phase as shown in the XRD spectrum, as Figure 6 As shown in the TEM photo, the prepared vanadium dioxide powder is granular, and each vanadium dioxide particle is a single crystal particle, and its grain size is mainly concentrated between 40-50nm, and the aspect ratio is less than 2:1.

Embodiment 2

[0070] With 1g VOSO 4 and 7.5mg Bi 2 o 3 Repeat the experiment of implementing 1 to make vanadium dioxide nanopowder, its chemical formula is V 0.995 Bi 0.005 o 2 , the yield is 85%. Its crystal phase is also M phase, and each vanadium dioxide particle is a single crystal particle, and its grain size is mainly concentrated between 40-70nm, and the aspect ratio is 1:1-3:1.

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Abstract

The invention relates to vanadium dioxide-doped powder, vanadium dioxide-doped dispersion, and a preparation method and application thereof. The chemical compositions of the vanadium dioxide-doped powder shown as V1-xMxO2 (x is more than 0 and less than or equal to 0.5, and M is a doped element used for controlling the size and appearance of the vanadium dioxide-doped powder.). The vanadium dioxide-doped powder has uniform grain size and high dispersibility.

Description

technical field [0001] The invention relates to the preparation of vanadium dioxide powder in the fields of chemical industry and materials, in particular to doped vanadium dioxide powder, its preparation method and application. Background technique [0002] Under the situation of tightening global energy supply and deteriorating environment, energy conservation and emission reduction have become the common goal of all countries in the world. According to a report published by the United Nations Environment Program on December 11, 2009, one-third of global greenhouse gas emissions are related to building energy consumption. my country is a big energy-consuming country, and the annual energy consumption is equivalent to 1.5 billion tons of standard coal, of which about 30% is energy consumption for buildings. The most serious building energy consumption is glass, whose energy loss accounts for 50% of the entire building energy consumption. Therefore, by promoting energy sav...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G31/02C09D1/00
Inventor 高彦峰戴雷曹传祥罗宏杰金平实
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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