Silicon-containing thiophene organic photoelectric material and preparation method and application thereof
A technology of organic optoelectronic materials and manufacturing methods, which can be used in organic chemistry, chemical instruments and methods, semiconductor/solid-state device manufacturing, etc., and can solve problems such as low photoelectric conversion efficiency
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Embodiment 1
[0062] The silicon-containing thiophene organic photoelectric material of the present embodiment 1 is R 1 and R 2 Using hexyl, R 3 , R 4 Taking 2-ethyl-hexyl as an example, its structural formula is as follows:
[0063]
[0064] It can be seen from the structural formula that the silicon-containing thiophene organic photoelectric material in Example 1 has a symmetrical structure, with a hexathiophene ring and two pairs of cyano groups, and the cyano groups serve as electron-withdrawing groups. Through this uniform and symmetrical structure, the silicon-containing Thiophene organic optoelectronic materials have relatively good light absorption properties and optoelectronic properties.
[0065] The preparation method of this hexathiophene adopts the concrete operations of the first scheme as follows:
[0066] 1) Preparation of 2-((2-bromo-5-(5-hexylthiophen-2-yl)thiophen-3-yl)methylene)malononitrile, whose structural formula is as follows:
[0067]
[0068] Since the ...
Embodiment 2
[0075] The silicon-containing thiophene organic photoelectric material of this embodiment is the same as that of Embodiment 1, but adopts the second preparation scheme, specifically as follows:
[0076] 1) Preparation of 2-(2-(3-formyl-5-(5-hexylthiophen-2-yl)thiophen-2-yl)-4,4'-bis(2-ethyl-hexyl)-dithiophene [3,2-b: 2',3'-d]silol-5-yl)-5-(5-hexylthiophen-2-yl)thiophene-3-carbaldehyde, its structural formula is as follows:
[0077]
[0078] The specific preparation process is: add 40mL THF to a pressure-resistant tube, quickly add 5-bromo-5'-hexyl-2,2'-dithiophene-4-carbaldehyde (0.43g, 1.20mmol) and 4,4' - Bis(2-ethyl-hexyl)-5,5'-bis(trimethyltin)-dithiophene[3,2-b:2',3'-d]silole (0.74g, 1.00mmol) , Nitrogen to below the liquid level for 20 minutes, then add Pd 2 (dba) 3 (0.0230g, 0.025mmol) and P(o-Tol) 3 (0.0152g, 0.050mmol), nitrogen was passed below the liquid level for 20 minutes, the lid was sealed, the temperature was raised to 80°C, and the reaction was carried...
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