Nonplanar micron/submicron microneedle array and method for producing same

A micro-needle array, sub-micron technology, which is applied in chemical instruments and methods, separation methods, photo-engraving processes of pattern surfaces, etc., can solve the problems of high preparation cost, limited application field and scope, etc. Simple and reliable effects

Inactive Publication Date: 2012-06-20
WUXI IMPRINT NANO TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the current preparation of microneedle arrays mainly relies on microfabrication techniques, such as reactive ion beam etching, photolithography, etc., the preparation cost is extremely high, which greatly limits its application field and scope.

Method used

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  • Nonplanar micron/submicron microneedle array and method for producing same
  • Nonplanar micron/submicron microneedle array and method for producing same

Examples

Experimental program
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Embodiment 1

[0015] Example 1: Cut the composite structure of quartz glass fiber and polymethyl methacrylate with a diameter of 200nm into a short column, process the end face of the short column into a convex surface by cutting, and put it into a 40% HF acid corrosion solution , at a temperature of 90° C., corroded for 10 seconds to form a needle-like array structure, and the polymethyl methacrylate was removed by soaking in chloroform to obtain convex micron and submicron microneedle arrays.

Embodiment 2

[0016] Embodiment 2: Cut the composite structure of soda-lime-silica glass fiber and polystyrene with a diameter of 3um into a short column, process the end face of the short column into a concave surface by grinding, and put it into a HF acid corrosion solution with a concentration of 20%. At 50°C, corrode for 2 hours to form a needle-like array structure, and remove polystyrene by soaking in toluene to obtain concave micron and submicron microneedle arrays.

Embodiment 3

[0017] Embodiment 3: SiO with a diameter of 1000um 2 The composite structure of fiber and rosin is cut into a short column, and the end surface of the short column is treated into a groove shape by grinding, put into a HF acid corrosion solution with a concentration of 0.01%, and corroded for 72 hours at a temperature of 80°C to form a needle shape. For the array structure, rosin is removed by soaking in ethanol to obtain groove-like micron and submicron microneedle arrays.

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Abstract

The invention discloses a nonplanar micron/submicron microneedle array and a method for producing the same. The nonplanar micron/submicron microneedle array comprises parallel microneedles 200 nanometers to 1000 micrometers in diameter. Tips of the microneedle array form a convex face, a concave face, grooves and holes, or any combination of these, and the microneedles are made of quartz glass, soda-lime-silica glass, borate glass and the like. The method for preparation includes: firstly, obtaining a fiber and polymer composite structure by a method provided by a patent ZL200710134575.2, and cutting the structure into short posts; secondly, the end face of each short post is machined into the convex face, the concave face, the grooved face and the holed face, or any combination of these; thirdly, placing the sample into HF (hydrofluoric) acid etchant solution for 10 seconds to 72 hours to form a needle array structure; and fourthly, removing filled polymer and obtaining the nonplanar micron/submicron microneedle array. The nonplanar micron/submicron microneedle array is novel in structure and applicable to the fields of detection, sensing, optics, biomedicine and the like.

Description

technical field [0001] The invention relates to a preparation method of nanometer and micron microstructure materials, in particular to a preparation method of non-planar micron and submicron microneedle arrays. Background technique [0002] Fabrication of non-planar micron and submicron microneedle arrays is a technology with important application background. Because there are pores between the microneedle arrays, and the tips of the microneedle arrays are not on the same plane, this special shape and structural features endow it with special functions and applications. For example, the micron and submicron microneedle arrays of concave type, that is, the tip forms a concave surface, and after the surface treatment of polydimethylsiloxane, a superhydrophobic concave surface is formed, which can study the liquid confined on the surface. The movement of groove type micron and submicron microneedles can control the superhydrophobic flow of liquid after surface treatment with ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81B1/00B81C3/00
Inventor 袁长胜陈延峰葛海雄卢明辉
Owner WUXI IMPRINT NANO TECH
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