Polishing solution used for precision machining of optical communication ZrO2 ceramic stub and preparation method thereof

A technology of ceramic ferrule and precision machining, applied to polishing compositions containing abrasives, etc., can solve the problems of inability to achieve polishing effect, uncoordinated polishing efficiency and polishing accuracy, and achieve easy cleaning, improve polishing accuracy, and agglomeration phenomenon. small effect

Inactive Publication Date: 2014-07-09
HENAN CHEM IND RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art, provide a polishing solution containing mixed abrasives of cerium oxide and alumina micropowder, and solve the problem of uncoordinated polishing efficiency and polishing accuracy of using a single inorganic abrasive in traditional CMP technology , to achieve a polishing effect that cannot be achieved by a single abrasive, and the invention also provides a preparation method for the polishing liquid

Method used

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  • Polishing solution used for precision machining of optical communication ZrO2 ceramic stub and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0033] Example 1 Optical communication Zr0 2 Polishing liquid for precision machining of ceramic ferrule and preparation method thereof

[0034] Take 51.2 grams of CeO 2 (average particle size of 0.78μm) and 12.8 grams of Al 2 o 3 (average particle size is 0.5μm) micropowder, add 300 grams of deionized water and 0.32 grams of nitric acid, stir and disperse in the stirring disperser for 0.5h, add 1.6 grams of glycerol, 2.4 grams of polyvinyl alcohol derivatives, 0.16 grams of nonyl Phenol polyoxyethylene ether and 431 grams of deionized water, continue to stir and disperse for 2.0 hours, add triethanolamine to adjust the pH value to 4.5, disperse by ultrasonic waves for 20 minutes, and sieve to obtain the solid content (CeO 2 、Al 2 o 3 Micropowder) is a suspension solution of 8.0%wt, and the viscosity of the dispersion is 0.015Pa.s, which is the polishing solution of the present invention.

example 2

[0035] Example 2 Optical communication Zr0 2 Polishing liquid for precision machining of ceramic ferrule and preparation method thereof

[0036] Take 48 grams of CeO 2 (average particle size of 0.78μm) and 16 grams of Al 2 o 3 (average particle size of 0.5 μm) micropowder, add 300 grams of deionized water and 0.32 grams of nitric acid, stir and disperse in a stirring disperser for 0.5 hours, add 1.6 grams of glycerol, 2.4 grams of polyvinyl alcohol, 0.16 grams of nonylphenol poly Oxyethylene ether and 431 grams of deionized water, continue to stir and disperse for 2.0 hours, adjust the pH value to 4.5 with triethanolamine, disperse by ultrasonic waves for 20 minutes, and sieve to obtain a suspension solution with a solid content of 8.0%wt. The viscosity of the dispersion is 0.016Pa. s is the polishing liquid of the present invention.

example 3

[0037] Example 3 Optical communication Zr0 2 Polishing liquid for precision machining of ceramic ferrule and preparation method thereof

[0038] Take 42.6 grams of CeO 2 (average particle size of 0.78 μm) and 21.4 grams of Al 2 o 3 (average particle size of 0.5 μm) micropowder, add 300 grams of deionized water and 0.32 grams of nitric acid, stir and disperse in a stirring disperser for 0.5 hours, add 1.6 grams of glycerol, 2.4 grams of polyvinyl alcohol, 0.16 grams of nonylphenol poly Oxyethylene ether and 431 grams of deionized water, continue to stir and disperse for 2.0 hours, adjust the pH value to 4.5 with triethanolamine, disperse by ultrasonic wave for 20 minutes, and sieve to obtain a suspension solution with a solid content of 8.0%wt. The viscosity of the dispersion is 0.015Pa. s is the polishing liquid of the present invention.

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Abstract

The invention discloses a CMP polishing liquid for the surface of an optical communication ZrO2 ceramic ferrule and a preparation method thereof. The polishing liquid is composed of: 0.5-12% of cerium oxide, 0.1-4% of aluminum oxide, 0.01-0.1% of a wetting regulator, Dispersant 0.05-2%, dispersion stabilizer 0.01-4%, co-surfactant 0.005-0.5%, and the balance is deionized water. When preparing, add cerium oxide and alumina to the stirring disperser, add part of deionized water and wetting modifier, stir evenly, add the remaining additives and the remaining amount of deionized water, continue stirring, and adjust the pH value to 2~ 5. After ultrasonic dispersion. The polishing liquid of the present invention solves the contradiction between the uncoordinated polishing efficiency and polishing precision of using a single inorganic abrasive in the traditional CMP technology, achieves a polishing effect that cannot be achieved by a single abrasive, not only improves the polishing efficiency, but also improves the polishing accuracy, and has good application performance.

Description

technical field [0001] The present invention relates to a kind of polishing fluid for precise processing, particularly relate to a kind of optical communication Zr0 2 A polishing fluid for precision machining of ceramic ferrules and a preparation method thereof. Background technique [0002] In recent years, optical communication has developed extremely rapidly. On the one hand, it is developing in the direction of ultra-high speed, large capacity, and long distance; on the other hand, the optical fiber LAN user system has been vigorously developed. All-optical communication is the inevitable direction of optical communication development. In the modern optical fiber communication industry, optical fiber connectors are the most widely used optical passive devices and have the greatest impact on the transmission quality of optical fiber communication. to the receiving optical fiber, and guarantee the transmission quality. The core and basic components of fiber optic connect...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09G1/02
Inventor 刘玉林梁遂芳汪心想赵怡丽杨献红张慧敏夏成浩王静
Owner HENAN CHEM IND RES INST
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