V-Al-N hard coating with nano composite structure and preparation method thereof
A nano-composite, hard coating technology, applied in coating, metal material coating process, ion implantation plating and other directions, can solve the problems of poor coating lubricity, low friction coefficient, low coating hardness, etc. The effect of good quality, low friction coefficient and good economic benefits
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[0038] The preparation method of the V-Al-N hard coating with nano composite structure includes the following steps:
[0039] (1) Matrix 2 cleaning:
[0040] First put the substrate 2 into Borer's detergent model HT1401 and ultrasonically clean at 60~70℃ for 3 to 10 minutes, and then put it into Borer's model HT1233 detergent at 50~60 Ultrasonic cleaning at a temperature of ℃ for 3-10 minutes, then ultrasonic cleaning in deionized water at 45-55℃ for 0.5-3 minutes, and finally put the cleaned substrate in a vacuum drying oven at 95-105℃ for 3-10 minutes After drying, put it on the rotatable base frame in the vacuum chamber;
[0041] Or, first put the substrate 2 in acetone and ultrasonically clean at a temperature of 60-70°C for 3-10 minutes, then put it in ethanol and ultrasonically clean it at a temperature of 50-60°C for 3-10 minutes, and then clean it at 45-55°C. Ultrasonic cleaning in deionized water at ℃ for 0.5 to 3 minutes, and finally put the cleaned substrate 2 into a vac...
Example Embodiment
[0048] Example 1
[0049] (1) Substrate cleaning: first put the substrate into Borer's HT1401 detergent (pH value 12.2) and ultrasonically clean at 65°C for 5 minutes, and then put it into Borer's HT1233 Ultrasonic cleaning in detergent (pH 9.2) at 55°C for 5 minutes, then ultrasonic cleaning in deionized water at 50°C for 1 minute, and finally put the cleaned substrate in a vacuum drying oven at 105°C for baking After drying for 5 minutes, put it on the rotatable base frame in the vacuum chamber.
[0050] (2) Deposited coating: In the vacuum chamber, the background pressure of the vacuum chamber is (4.5±0.5)×10 -5 Pa, the Al target is installed on the intermediate frequency cathode, the V target is installed on the DC cathode, the distance between the Al target and the V target and the substrate is 9.2cm, the Al target and the V target are separated from the substrate by the baffle, and Ar gas is introduced first, The flow rate of Ar gas is 32 sccm, pre-sputtering for 10 minutes,...
Example Embodiment
[0052] Example 2
[0053] (1) Substrate cleaning: first put the substrate into Borer's HT1401 detergent (pH value 12.2) and ultrasonically clean at 65°C for 5 minutes, and then put it into Borer's HT1233 Ultrasonic cleaning in detergent (pH 9.2) at 55°C for 5 minutes, then ultrasonic cleaning in deionized water at 50°C for 1 minute, and finally put the cleaned substrate in a vacuum drying oven at 105°C for baking After drying for 5 minutes, put it on the rotatable base frame in the vacuum chamber.
[0054] (2) Deposited coating: In the vacuum chamber, the background pressure of the vacuum chamber is (4.5±0.5)×10 -5 Pa, the Al target is installed on the intermediate frequency cathode, the V target is installed on the DC cathode, the distance between the Al target and the V target and the substrate is 9.2cm, the Al target and the V target are separated from the substrate by the baffle, and Ar gas is introduced first, The flow rate of Ar gas is 32 sccm, pre-sputtering for 10 minutes,...
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