MgZnO solar-blind photoresistor and preparation method thereof
A photosensitive resistor, solar blind technology, applied in the field of optoelectronic information, can solve the problems of large lattice mismatch of sapphire and difficult preparation, etc.
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[0018] A MgZnO solar-blind photoresistor, the solar-blind photoresistor is the first layer of Mg grown on the R surface sapphire substrate with low composition Mg x Zn 1-x O transition layer, second layer Mg y Zn 1-y O transition layer, MgZnO film and electrode with high composition of Mg. The first layer of Mg x Zn 1-x X=0.16-0.20 in O transition layer, thickness is 2-10nm; Described second layer Mg y Zn 1-y Y=0.26-0.40 in O transition layer, thickness is 2-10nm; Described Mg Z Zn 1-Z Z=0.43-0.55 in the O film.
[0019] A kind of MgZnO sun-blind photoresistor preparation method 1, the steps of this method comprise:
[0020] Step 1: Pass the cleaned R-plane sapphire substrate into the MBE pre-growth chamber;
[0021] Step 2 R-plane sapphire substrate is treated in the pre-growth chamber at 750°C for 15 minutes;
[0022] Step 3 The R-plane sapphire substrate is introduced into the growth chamber, and the first layer of Mg with a thickness of 2nm is grown at a growth ...
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