PVD (Physical Vapor Deposition) super-black coating

Abstract

The invention provides a PVD (Physical Vapor Deposition) super-black coating. A 0.05-0.15 micron thick metal film layer, a 0.05-0.15 micron thick magnetron sputtering compound layer, a 0.10-0.20 micron thick jointing base coating, a 0.20-1.00 micron thick metal compound transition layer and a 0.20-0.50 micron thick compound surface layer are arranged on a metal substrate in turn. The PVD super-black coating has the advantages that the color blackness of the PVD super-black coating is deep, L value can reach 26, the binding force of the film layer is high, the surface smoothness is high, the compactness of the film layer is high, and the PVD super-black coating is suitable for mass production.

Description

technical field [0001] The invention relates to the field of PVD vacuum ion coating, in particular to an ultra-black coating formed by the improvement of a sputtering and plasma arc coating machine. Background technique [0002] PVD is the abbreviation of Physical Vapor Deposition in English, which means "Physical Vapor Deposition" in Chinese, which refers to the film preparation technology that deposits materials on the workpiece to be plated by physical methods under vacuum conditions. The method of PVD is to transfer the desired bulk deposited physical material to the surface of the substrate through direct mass transfer. [0003] PVD (Physical Vapor Deposition) technology is mainly divided into three categories, vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating. Compared with the three classifications of PVD technology, the corresponding vacuum coating equipment also includes vacuum evaporation coating machine, vacuum sputtering coating machin...

AI Technical Summary

Problems solved by technology

[0005] Plasma arc (commonly known as electric arc, multi-arc) deposition refers to the generation of arc discharge on the surface of the target (the material to be deposited) under certain vacuum conditions, thereby causing changes in the physical state of the target, and simultaneously ejecting target atoms, Ions, molten particles; advantages: high evaporation rate of deposited ions, high sputtering energy; disadvantages: relatively rough film; in the preparation of metal carbide coatings, due to the poisoning of the target surface, the arc is unstable and even arc extinguished

[0006] Sputtering deposition refers to the generation of glow discharge on the target surface under certain vacuum conditions, and at the same time high-energy ions or neutral atoms are generated to collide with the target, and some materials are sputtered from the target surface through the transfer of kinetic energy; advantages : The deposited particles are mainly atoms, and the deposited coating is smoother; Disadvantage: The bonding fastness is worse than that of arc

The resistance value of the target surface will also become larger and larger (even insulation), resulting in unstable glow (or termination of glow power generation), making sputtering deposition impossible; therefore, under the existing technical conditions, in order to prevent target poisoning When the glow is unstable, the ratio of the metal compound can only be reduced rigidly, and the blackness of the produced black film layer is always light, and it is difficult to reach the depth of the favorite piano black developed by major 3C companies; in addition, traditional sputtering deposition The energy is low, and the overall film layer 40 formed is relatively loose, resulting in poor bonding force between the entire film layer 40 and the substrate 10; although simply increasing the deposition temperature can improve the material, shape, thickness, etc. of the substrate 10 of the coating film. There are more limitations, which is not conducive to large-scale industrial application

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