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Preparation method for high-refractivity scattering layer and preparation method for organic light-emitting diode (OLED) with high luminous efficiency

A technology of high refractive index and scattering layer, which is applied in the manufacture of semiconductor/solid-state devices, electrical components, electric solid-state devices, etc., can solve the problem of poor surface flatness of the scattering film layer, the lack of scattering effect of the film layer, and particles in the scattering film Unevenness and other problems, to achieve good flatness, improved light extraction efficiency, and uniform film-making solution

Active Publication Date: 2012-10-03
GUAN YEOLIGHT TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Excessive solute content will cause the solvent to fail to form a film or the surface of the prepared scattering film will have uneven particles, large particles will exist on the surface of the scattering film, and the OLED device will have defects such as short circuit and poor stability; while the solute content will be too low. The formed film layer does not have the effect of scattering; therefore how to determine the content of solute is the focus of research by those skilled in the art
[0008] In addition, since the scattering particles in the film-forming solvent are formed by dissolving particles of a certain size in an organic solvent, the solute may precipitate, and the solute precipitation will cause the scattering film during the spin-coating film-forming process. The thickness of the film is not uniform, so that the flatness of the surface of the film layer is poor, and how to solve the problem of poor surface flatness of the scattering film layer caused by solute precipitation is also not disclosed in the prior art

Method used

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  • Preparation method for high-refractivity scattering layer and preparation method for organic light-emitting diode (OLED) with high luminous efficiency
  • Preparation method for high-refractivity scattering layer and preparation method for organic light-emitting diode (OLED) with high luminous efficiency
  • Preparation method for high-refractivity scattering layer and preparation method for organic light-emitting diode (OLED) with high luminous efficiency

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] This embodiment provides a method for preparing a high refractive index scattering layer, comprising the following steps:

[0047] S1, prepare grinding dispersion liquid, described grinding dispersion liquid comprises:

[0048] High refractive index scattering particles, in this embodiment, the high refractive index scattering particles are selected as TiO 2 , its weight selection is 15g, and its mass percentage is 18.6%;

[0049] Dispersant, the dispersant selects byk-163 produced by BYK Chemical Co., Ltd. as a dispersant, its weight is selected as 1.2g, and its mass accounts for 8% of the high refractive index scattering particles;

[0050] Organic solvent, select propylene glycol methyl ether acetate as organic solvent, its weight selection is 60g, and its mass percentage is 78.74%;

[0051]Put the above-prepared solution into the grinding tank, fix the grinding tank and the grinding column, add 90ml of zirconium beads (note: the amount of zirconium beads depends o...

Embodiment 2

[0063] In this example, the following improvements are made on the basis of Example 1. An anti-sedimentation agent is added to the grinding dispersion, and byk-410 produced by BYK Chemical Co., Ltd. is selected, and its weight is selected to be 0.8g, and its mass percentage is 1.03 %;

[0064] And, in this embodiment, the following steps are also included between the step S2 and the step S3: adding photoresist to the film-forming solution prepared in the step S2; in this embodiment Among them, the photoresist is selected to be mixed with the film forming solution, and the mass percentage of the photoresist is 40%.

[0065] In this embodiment, the thickness of the scattering layer is 0.6um. The light extraction efficiency of the OLED device prepared by the preparation method in this example is increased by 100%.

Embodiment 3

[0067] The preparation method of the high refractive index scattering layer provided in this embodiment includes the following steps:

[0068] S1, prepare grinding dispersion liquid, described grinding dispersion liquid comprises:

[0069] High refractive index scattering particles, the mass percentage is: 10%;

[0070] Dispersant, its mass accounts for 36% of the high refractive index scattering particles, that is, its mass percentage is 3.6%;

[0071] Anti-sedimentation agent, its mass percentage is: 5%;

[0072] Photoresist, its mass percentage is: 51.5%;

[0073] Organic solvent, its mass percentage is: 30%;

[0074] S2. Press-filter the grinding dispersion prepared in the step S1 using a filter paper with a filter pore diameter of 0.9um to obtain a film-forming solution;

[0075] S3. The film forming solution prepared in the step S2 is prepared by photolithography and spin coating to obtain a high refractive index scattering layer.

[0076] In this embodiment, the hi...

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Abstract

The invention discloses a preparation method for a high-refractivity scattering layer and a preparation method for an organic light-emitting diode (OLED) with high luminous efficiency. The preparation method for the high-refractivity scattering layer comprises the following steps of: S1, preparing grinding dispersion, wherein the grinding dispersion comprises 10 to 60 mass percent of high-refractivity scattering particle, a dispersing agent of which the mass is 1 to 60 percent based on the mass of the high-refractivity scattering particles, 0 to 5 mass percent of anti-settling agent, 0 to 60 mass percent of photoresist and 20 to 89.9 mass percent of organic solvent; S2, filter-pressing the grinding dispersion prepared by the step S1 by using filter paper with filtering hole apertures of 0.8 to 1.2 mu m to obtain a film preparation solution; and S3, photoetching and spinning the film preparation solution prepared by the step S2 to obtain the high-refractivity scattering layer. When the high-refractivity scattering layer is arranged between a substrate and an electrode of the OLED with the high luminous efficiency, the luminous efficiency of the OLED can be greatly improved.

Description

technical field [0001] The invention relates to a preparation method of an organic electroluminescent device, in particular to a preparation method of a high refractive index scattering layer and a preparation method of an OLED with high light extraction efficiency. Background technique [0002] OLED (Organic Light-Emitting Diode) is an organic light-emitting diode. A light-emitting unit is arranged on a substrate. The light-emitting unit includes two electrodes, and an organic electroluminescent material layer is arranged between the two electrodes. In the prior art, transparent glass is generally selected as the substrate, and the refractive index of the glass is generally 1.4-1.5, and the refractive index of the organic electroluminescent material layer is generally 1.7-1.8. Therefore, when the light emitted by the organic electroluminescent material is energized and enters the air through the glass, due to the principle of total reflection, most of the light will be conf...

Claims

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Application Information

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IPC IPC(8): H01L51/56
Inventor 张国辉董艳波刘永祥段炼
Owner GUAN YEOLIGHT TECH CO LTD
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