Processing method for trichlorosilane gas
A technology of trichlorosilane and treatment method, applied in separation methods, chemical instruments and methods, dispersed particle separation, etc., can solve high boilers and dust residues, long process flow, incomplete removal of high boilers and dust, etc. problem, to achieve the effect of reducing wastage and high washing rate
Active Publication Date: 2014-12-10
XINJIANG DAQO NEW ENERGY
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Problems solved by technology
Dry dedusting uses a series of three-stage cyclone separators to remove dust, and removes 70% to 80% of solid particles. The main problem is that the process is long and the removal of high boilers and dust is not complete; The trichlorosilane synthesis gas is passed into the washing tower for washing, and the solid particles and most of the chloride salts in the synthesis gas are washed off, but some high boiling substances and dust still remain
Method used
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Embodiment 1
[0033] According to attached figure 1 The schematic diagram of the working process of the trichlorosilane synthesis gas provided can clearly indicate the treatment process of the trichlorosilane synthesis gas. The synthesis gas from the trichlorosilane synthesis furnace is sent to the synthesis gas quenching tower 1, at this time the synthesis gas contains hydrogen, hydrogen chloride, dichlorosilane, trichlorosilane, silicon tetrachloride, silicon powder, iron aluminum calcium Impurities and aluminum trichloride, the synthesis gas is sprayed through the two-stage spraying of the quench liquid from the buffer tank 8 and the circulating liquid of the quench tower 1, and more than 99% of the high boilers and dust are washed down, and the composition of the synthesis gas after washing It is hydrogen, hydrogen chloride, dichlorodihydrosilane, trichlorosilane and tetrachlorosilane, and then the mixed gas of chlorosilane enters the tower top quencher 7 and enters the buffer tank 8 fo...
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The invention provides a processing method for trichlorosilane gas, comprising the steps of: spray washing the trichlorosilane gas by using washing liquid in a quench tower wherein the pressure is 0.1Mpa-0.3Mpa and the temperature is 35-55 DEG C; and separating the washed trichlorosilane gas and the used washing liquid. The ratio of the gas flow of the trichlorosilane gas and the liquid spray flow of the washing liquid in the quench tower is 1L / m3 / (10-20)L / m3. The method through the pressure and temperature control of the quench tower, and the interlocking control of the gas flow of the trichlorosilane gas and the liquid spray flow of the washing liquid in the quench tower, enables the trichlorosilane gas fully contact with the washing liquid, and thereby the high boiling matters and the dust particles are washed away with a relatively high wash-away rate of the high boiling matters and the dust particles.
Description
technical field [0001] The invention relates to the field of polysilicon production, in particular to a treatment method for trichlorosilane synthesis gas. Background technique [0002] Faced with the dual pressure of environment and energy, the uncertainty of natural disasters limits the development of nuclear energy, so solar energy is an irreplaceable renewable energy in the future. How to efficiently utilize solar energy is an important issue that we humans face. Among various solar photovoltaic materials, polysilicon material is one of the important photovoltaic materials. The commonly used method to produce polysilicon is the modified Siemens method, and the polysilicon produced by the modified Siemens method accounts for more than 80% of the world's total polysilicon production. [0003] The raw material for the production of polysilicon by the improved Siemens method is trichlorosilane. Trichlorosilane, also known as trichlorosilane or silicon chloroform, is an im...
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IPC IPC(8): B01D47/06
Inventor 潘和平朱国平周鹏
Owner XINJIANG DAQO NEW ENERGY