Chemical mechanical polishing aqueous composite and chemical mechanical polishing process of titanium substrate
A water-based composition, chemical mechanical technology, applied in the direction of polishing composition containing abrasives, etc., can solve the problems that need to be improved, and achieve the effects of reducing surface defects and particle residues, ensuring stability, and easy operation
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Embodiment 1
[0041] Example 1 Influence of the change of polishing liquid and polishing pressure on the polishing effect during the initial polishing process
[0042] According to the conditions described in the following experimental groups and control groups, the initial polishing experiment of the titanium substrate was carried out respectively, and then the polishing effects of each group were compared:
[0043] 1. Grouping and processing methods
[0044] Experimental group 1:
[0045] Add 20 grams of 2-phosphonobutane-1,2,4-tricarboxylic acid, 10 grams of lactic acid (corrosion inhibitor film-forming agent), and 10 grams of ammonium fluoride (complexing agent) into 500 grams of deionized water in sequence, Stir to dissolve, and then stir slowly to add 187 grams of 30% 25nm silica hydrosol (abrasive).
[0046] Before polishing, add 60 grams of 30% oxidant hydrogen peroxide solution to the above mixture, and wash with H 2 SO 4 Calibrate its pH value to 3.0, and finally add water t...
Embodiment 2
[0064] Influence of the composition and pH value of the chemical mechanical polishing aqueous composition on the polishing effect in the process of embodiment 2 fine polishing
[0065] According to the conditions described in the following experimental groups and control groups, the titanium substrates after the initial polishing were respectively finely polished, and then the polishing effects of each group were compared:
[0066] 1. Grouping and processing methods
[0067] Experimental group 1:
[0068] Add 20 grams of 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA), 10 grams of lactic acid (LA) (corrosion inhibitor film-forming agent), and 10 grams of ammonium fluoride (complexing agent) in sequence 500 grams of deionized water, stir to dissolve, evenly stir slowly and add 187 grams of 30% 25nm silica hydrosol (abrasive).
[0069] Before polishing, add 60 grams of 30% oxidant hydrogen peroxide solution to the above mixture, and wash with H 2 SO 4 Calibrate its pH v...
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