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Curable resin composition for photo spacer, column spacer and liquid crystal display

A curable resin and photosensitive spacer technology, which is applied in the field of curable resin composition and column spacer, can solve the problems of lack of elastic recovery force, inability to maintain the distance between substrates, and insufficient recovery, etc., and achieve good substrate adhesion Effect

Active Publication Date: 2013-01-02
NIPPON SHOKUBAI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A spacer is a material used to maintain a constant distance between two glass substrates. If it lacks elastic restoring force, it cannot fully recover after compression, and there may be a problem that the desired distance between the substrates cannot be maintained.

Method used

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  • Curable resin composition for photo spacer, column spacer and liquid crystal display
  • Curable resin composition for photo spacer, column spacer and liquid crystal display
  • Curable resin composition for photo spacer, column spacer and liquid crystal display

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-1

[0133]35 parts of benzylmaleimide (BzMI), 114 parts of acrylic acid (AA), 42 parts of acryloylmorpholine (ACMO; manufactured by Kojinsha), ethoxylated o-phenylphenol acrylate (trade name "A -LEN-10"; manufactured by Shin-Nakamura Chemical Co., Ltd.), 42 parts, tert-butyl peroxy-2-ethylhexanoate ("パググチル (registered trademark) O", manufactured by NOF Corporation; (PBO)) 4.7 parts , 56 parts of propylene glycol methyl ether acetate (PGMEA) and 84 parts of propylene glycol monomethyl ether (PGME) were fully stirred and mixed into the monomer dropping tank. In addition, 2.8 parts of n-dodecyl mercaptan (n-DM), 12 parts of polysiloxane modified with mercapto groups at both ends (trade name "X-22-167B"; manufactured by Shin-Etsu Silicone Co., Ltd.), and 19 parts of PGMEA And 29 parts of PGME are fully stirred and mixed into the chain transfer agent dropping tank.

[0134] A detachable flask with a cooling tube was prepared as a reaction tank, and 142 parts of PGMEA and 214 parts of ...

Embodiment 1-2

[0137] [Synthesis of Monomer]

[0138] In a container equipped with a stirring device, a thermometer, a reflux cooler, a nitrogen introduction pipe, and a dropping funnel, add 200 parts of tetrahydrofuran as a solvent, 106 parts of p-hydroxybiphenyl, 1 part of dibutyltin dilaurate as a catalyst, and 0.1 part of 2,6-dibutyl-4-methylphenol as a polymerization inhibitor is dripped from the dropping funnel at 40°C for 1 hour while blowing nitrogen / oxygen mixed gas (oxygen concentration 7% by volume) After adding 88 parts of 2-isocyanate ethyl acrylate (trade name "Karenz AOI (registered trademark)", manufactured by Showa Denko Co., Ltd.), the mixture was reacted at 60° C. for 2 hours. Then, the synthesized compound (A) as a biphenyl group-containing monomer was precipitated using a weak solvent, n-hexane, to obtain a compound (A).

[0139] [Synthesis of Polymer]

[0140] 35 parts of BzMI, 114 parts of AA, 84 parts of the above-mentioned compound (A), 4.7 parts of PBO, 98 parts o...

Embodiment 1-3

[0144] 38 parts of BzMI, 124 parts of AA, 91 parts of A-LEN-10, 5.1 parts of PBO, 106 parts of PGMEA, and 46 parts of PGME were fully stirred and mixed into the monomer dropping tank. Moreover, the mixture which fully stirred and mixed 3.8 parts of n-DM, 47 parts of PGMEA, and 20 parts of PGME was put into the chain transfer agent dripping tank.

[0145] A detachable flask with a cooling tube was prepared as a reaction tank, and 414 parts of PGMEA and 177 parts of PGME were added to the reaction tank. After nitrogen replacement, the reaction tank was heated by an oil bath while stirring, and the temperature of the reaction tank was raised to 90°C. After the temperature of the reaction tank was stabilized at 90° C., each component was dropped from the monomer dropping tank and the chain transfer agent dropping tank. While maintaining the inner temperature of the flask at 90° C., each dropping was performed for 180 minutes each. After the completion of the dropwise addition, th...

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Abstract

The invention provides a curable resin composition for a photo spacer to obtain a column spacer with good adhesiveness to a glass substrate or good elastic restoring force. The curable resin composition for the photo spacer of the invention is used for preparation of a column spacer of a liquid crystal box, and is characterized by comprising a photosensitive polymer, a polyfunctional monomer, and a photopolymerization initiator, wherein the photosensitive polymer is obtained by reaction of a compound having free-radical-polymerization unsaturated double bonds and a functional group that can react with an acid group with an acid group of an acid-group-containing polymer, which is obtained by synthesis of monomer components having the essential components of a monomer capable of introducing an acid group and a monomer having more than two aromatic nucleuses.

Description

technical field [0001] The present invention relates to a curable resin composition for a photo spacer (photo spacer) for obtaining a columnar spacer used in a liquid crystal cell and the like, and a columnar spacer obtained by curing the curable resin composition. A spacer, and a liquid crystal display obtained using the columnar spacer. Background technique [0002] The liquid crystal cell has a structure in which liquid crystal molecules are sandwiched and sealed between two glass plates, and a spacer is used to keep the gap between the two glass plates constant. In the past, spherical particles with uniform particle diameters were dispersed in the gaps of glass plates as spacers. However, spherical particles tend to roll because of their spherical shape. Sedimentation occurs during assembly into a liquid crystal display and causes chromatic aberration. [0003] Therefore, recently, columnar spacers are used especially in large liquid crystal displays. (eg, Patent Docu...

Claims

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Application Information

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IPC IPC(8): G03F7/027G02F1/1339
CPCC08F2/50C08F8/00C08F20/56C08L79/085G02F1/1339G03F7/038G02F1/13398
Inventor 橘裕己田中晋介凑边悠太加原浩二吉田雅年大槻信章
Owner NIPPON SHOKUBAI CO LTD
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