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Alkali-soluble resin, preparation method of alkali-soluble resin and photoresist

A technology of photoresist and soluble resin, which is applied in the field of alkali soluble resin and its preparation, and photoresist, which can solve the problem of incomplete removal of non-exposed areas, failure of photoresist, and rough surface and other problems, to achieve the effect of neat edges, enhanced stability, and reduced residue

Active Publication Date: 2013-01-30
BOE TECH GRP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the photoresist is to disperse the pigment in the resin solution, when the compatibility between the resin and the pigment is not good, the following problems usually occur: (1) The photoresist fails due to the re-agglomeration of the pigment during storage ; (2) During the development process, the non-exposed area cannot be completely removed, resulting in residue; (3) Due to uneven coating, the surface of the film is relatively rough

Method used

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  • Alkali-soluble resin, preparation method of alkali-soluble resin and photoresist
  • Alkali-soluble resin, preparation method of alkali-soluble resin and photoresist
  • Alkali-soluble resin, preparation method of alkali-soluble resin and photoresist

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preparation example Construction

[0038] The preparation method of alkali-soluble resin of the present invention, comprises the steps:

[0039] Make the alkali-soluble resin and β-cyclodextrin or β-cyclodextrin derivative undergo esterification or amidation reaction in an organic solvent environment to obtain the base modified with β-cyclodextrin or β-cyclodextrin derivative Soluble resin.

[0040] The esterification reaction can be carried out according to methods known in the art, for example, the esterification reaction is carried out under a nitrogen atmosphere and in the presence of concentrated sulfuric acid.

[0041] The amidation reaction can be carried out according to methods known in the art, such as the amidation reaction in the presence of 1-hydroxybenzotriazole and 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide conduct.

[0042] Among them, the organic solvent is generally used as a medium for the reaction and does not participate in the reaction. There are many types of organic solvents to choo...

Embodiment 1

[0055] First weigh 1 part by weight of alkali-soluble acrylic resin, dissolve it in 41 parts by weight of propylene glycol methyl ether acetate, add 5 parts by weight of β-cyclodextrin under a nitrogen atmosphere, then add 0.1 part by weight of concentrated sulfuric acid dropwise, and heat in an oil bath 60°C, react for 6h. During the reaction process, the water generated in the reaction is continuously removed by using the azeotropic method, and the reaction is pushed to the right. After the reaction, the solution was cooled to room temperature, and then the solvent was removed by rotary evaporation, washed with water, and dried in vacuum to obtain an alkali-soluble acrylic resin modified by β-cyclodextrin, such as figure 1 .

[0056] The ratio and position of modification of β-cyclodextrin were detected by proton nuclear magnetic spectrum.

[0057] Specific method: the chemical shift δ value of carboxyl proton is generally 10-12ppm, in 1 H NMR (CDCl 3 ,400MHz, ppm) on th...

Embodiment 2

[0059] First synthesize mono-(6-p-toluenesulfonyl)-β-cyclodextrin: add 50 parts by weight of water in the reactor, add 13 parts by weight of β-cyclodextrin in batches under stirring, keep the solution temperature with water bath Between 10-20°C. Sodium hydroxide aqueous solution (1 weight part sodium hydroxide is dissolved in 4 weight parts water) is added dropwise in the solution, after treating that β-cyclodextrin dissolves completely, continue stirring for 1 hour, then the acetonitrile solution of p-toluenesulfonyl chloride ( 2 parts by weight of p-toluenesulfonyl chloride dissolved in 6 parts by weight of acetonitrile) was slowly added dropwise to the above solution, and the stirring was continued at constant temperature for 2-2.5 hours. Remove the insoluble matter by filtration, adjust the pH value of the solution to 8-9 with 10% hydrochloric acid solution, place it at about 2°C for a day and night to precipitate a large amount of white precipitate, collect the precipitat...

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Abstract

The invention provides alkali-soluble resin, a preparation method of the alkali-soluble resin and a photoresist. The alkali-soluble resin is modified by beta-cyclodextrin or a derivative of the beta-cyclodextrin, the beta-cyclodextrin or the derivative of the beta-cyclodextrin is bonded with the alkali-soluble resin through an ester bond or an amido bond. The alkali-soluble resin can be used for preparing the photoresist. The alkali-soluble resin contributes to improvement of stability of the photoresist, contributes to promotion of developing natures, reduces production of residues and obtains uniform, smooth and flat graph surfaces.

Description

technical field [0001] The invention relates to the technical field of semiconductor processing, in particular to an alkali-soluble resin, a preparation method thereof, and a photoresist. Background technique [0002] The main components of general photoresists include alkali-soluble resins, photoactive compounds, photoinitiators, pigment dispersions, organic solvents and other additives. Since the photoresist is to disperse the pigment in the resin solution, when the compatibility between the resin and the pigment is not good, the following problems usually occur: (1) The photoresist fails due to the re-agglomeration of the pigment during storage ; (2) During the development process, the non-exposed area cannot be completely removed, resulting in residue; (3) Due to the uneven coating, the surface of the film is relatively rough. [0003] Cyclodextrins are formed by connecting D-glucopyranose units end-to-end through α-1,4 glycosidic bonds, and have different cavity sizes ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F20/00C08F8/32C08F8/14G03F7/004G03F7/027
Inventor 王雪岚薛建设刘宸陆金波
Owner BOE TECH GRP CO LTD
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