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Process for hydrothermally preparing zirconium oxychloride with low alkali consumption

A technology of zirconium oxychloride and process method, applied in chemical instruments and methods, inorganic chemistry, zirconium compounds, etc., can solve the problems of high purity, large NaOH consumption, environmental pollution, etc., and achieve the promotion of reaction efficiency, reaction speed, The effect of reducing consumption

Active Publication Date: 2014-11-26
安徽通湾科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] The purpose of the present invention is to solve the problems of large NaOH consumption, high energy consumption, excessive alkali cannot be recycled, and serious pollution to the environment in the process of producing zirconium oxychloride by zircon sand alkali fusion method, and to provide a low-consumption alkaline water A process for thermally preparing zirconium oxychloride, the zirconium oxychloride product obtained by this method has low impurity content and high purity

Method used

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  • Process for hydrothermally preparing zirconium oxychloride with low alkali consumption

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] 将氢氧化钠配制成50%重量比的水溶液,取3000g按ZrSiO 4 与 NaOH摩尔比1:6加入D50:1μm的超细锆英砂1146g,搅拌制浆后置入5L的高压反应釜中,反应温度300℃,调整反应压力为7MPa,反应时间3h,将反应物固液分离除去过量的碱,再将固液分离的产物用浓度20%Wt的盐酸水溶液充分溶解,反应摩尔比过量15%,得到反应物H 2 SiO 3 , ZrOCl 2 和NaCl水溶液,固液分离除去硅酸等杂质,余液在120℃负压蒸酸水解出ZrO(OH) 2 沉淀,控制pH5-6,固液分离并洗涤沉淀,除去钠离子,得到ZrO(OH) 2 滤饼,再次用浓度20%Wt的盐酸水溶液充分溶解,反应摩尔比过量15%,精密过滤后蒸酸水解,反应液水解出ZrO(OH) 2 沉淀,固液分离充分洗涤沉淀物,以此重复二次,有效除去产物中杂质。将洗净的ZrO(OH) 2 沉淀滤饼与浓度20%Wt的盐酸水溶液充分反应,反应摩尔比过量60%,浓缩,控制溶液酸度8g / L,溶液中的锆180 g / L,冷却至室温,结晶分离出ZrOCl 2 .8H 2 O,其中杂质含量(质量分数 / %)为:Fe 2 o 3 0.001、SiO 2 0.003、Na 2 O 0.003、TiO 2 0.001、CaO 0.001,优于HG / T2772-2004标准。

Embodiment 2

[0044] 将氢氧化钠配制成40%重量比的水溶液,取3000g按ZrSiO 4 与 NaOH摩尔比1:6加入D50:1μm的超细锆英砂917g,搅拌制浆后置入5L的高压反应釜中,反应温度250℃,调整反应压力为5MPa,反应时间5h,将反应物固液分离除去过量的碱,再将固液分离的产物用浓度15%Wt的盐酸水溶液充分溶解,反应摩尔比过量10%,得到反应物H 2 SiO 3 , ZrOCl 2 和NaCl水溶液,固液分离除去硅酸等杂质,余液在100℃负压蒸酸水解出ZrO(OH) 2 沉淀,控制pH5-6,固液分离并洗涤沉淀,除去钠离子,得到ZrO(OH) 2 滤饼,再次用浓度15%Wt的盐酸水溶液充分溶解,反应摩尔比过量10%,精密过滤后蒸酸水解,反应液水解出ZrO(OH) 2 沉淀,固液分离充分洗涤沉淀物,以此重复二次,有效除去产物中杂质。将洗净的ZrO(OH) 2 沉淀滤饼与浓度15%Wt的盐酸水溶液充分反应,反应摩尔比过量40%,浓缩,控制溶液酸度8g / L,溶液中的锆180 g / L,冷却至室温,结晶分离出ZrOCl 2 .8H 2 O,其中杂质含量(质量分数) / %为:Fe 2 o 3 0.0008、SiO 2 0.002、Na 2 O 0.001、TiO 2 0.001、CaO 0.0006,优于HG / T2772-2004标准。

Embodiment 3

[0046] 将氢氧化钠配制成30%重量比的水溶液,取3000g按ZrSiO 4 与 NaOH摩尔比1:3加入D50:5μm的超细锆英砂1375g,搅拌制浆后置入5L的高压釜中,反应温度200℃,调整反应压力为3MPa,反应时间12h,将反应物固液分离除去过量的碱,再将固液分离的产物用浓度20%Wt的盐酸水溶液充分溶解,反应摩尔比过量20%,得到反应物H 2 SiO 3 , ZrOCl 2 和NaCl水溶液,固液分离除去硅酸等杂质,余液在110℃负压蒸酸水解出ZrO(OH) 2 沉淀,控制pH5-6,固液分离并洗涤沉淀,除去钠离子,得到ZrO(OH) 2 滤饼,再次用浓度20%Wt的盐酸水溶液充分溶解,反应摩尔比过量20%,精密过滤后蒸酸水解,反应液水解出ZrO(OH) 2 沉淀,固液分离充分洗涤沉淀物,以此重复三次,有效除去产物中杂质。将洗净的ZrO(OH) 2 沉淀滤饼与浓度20%Wt的盐酸水溶液充分反应,摩尔比过量50%,浓缩,控制溶液酸度5.5g / L,溶液中的锆160 g / L,冷却至室温,结晶分离出ZrOCl 2 .8H 2 O,其中杂质含量(质量分数 / %)为:Fe 2 o 3 0.0003、SiO 2 0.001、Na 2 O 0.001、TiO 2 0.001、CaO 0.0004,优于HG / T2772-2004标准。

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Abstract

The invention relates to a process for hydrothermally preparing zirconium oxychloride with low alkali consumption, and belongs to the technical field of compound preparation. The process comprises the following steps: stirring crushed superfine zircon sand (ZrSiO4) powder with a NaOH solution to prepare slurry, and then placing the slurry into an autoclave to perform hydrothermal reaction, and thus generating amorphous or crystalline acmite sodium zirconium silicate (Na2ZrSiO5) precursors under a condition with the temperature of 200-300 DEG C, the pressure of 3-7MPa and the reaction time of 3-12 hours; and then removing sodium by use of hydrochloric acid, removing silicon, purifying, concentrating and crystallizing to obtain zirconium oxychloride crystals. The process can be used for not only solving the problems such as high NaOH consumption, high energy consumption, recycling incapability of excessive alkali and serious pollution to the environment in the process of preparing the zirconium oxychloride from zircon sand by an alkali fusion method, but also realizing low impurity content and high purity of a zirconium oxychloride product obtained by the method.

Description

technical field [0001] The invention relates to a process for preparing zirconium oxychloride by hydrothermal method with low alkali consumption, and belongs to the technical field of compound preparation. Background technique [0002] Zirconium oxychloride is widely used, it can be used as raw material of mordant dye and additive of mordant, color fixer, deodorant, flame retardant, etc. It is also an important raw material for industrial-grade and high-purity zirconia and nano-ultrafine zirconia. Nano zirconia has excellent physical and chemical properties such as high melting point, high strength, wear resistance, and corrosion resistance, and is mainly used in the manufacture of structural ceramics and functional materials; zirconium carbonate, zirconium sulfate, and zirconium nitrate can be prepared using zirconium oxychloride as raw material , Zirconium hydroxide and other zirconium chemicals are widely used in ceramics, chemical industry, light industry, electronics a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01G25/00
Inventor 周涛赵蜀春
Owner 安徽通湾科技有限公司