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Low-loss deep-ultraviolet multilayer film production method

A deep-ultraviolet multi-layer film and low-loss technology, which is applied in the field of deep-ultraviolet optical technology applications, can solve the problems of large absorption loss and large scattering loss of optical thin film systems, and overcome the relatively loose internal structure and avoid absorption loss Great effect of reducing absorption loss

Inactive Publication Date: 2013-04-03
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0007] The present invention solves the problem of large absorption loss of the optical thin film system caused by the application of the full oxide film layer and large scattering loss of the optical thin film system caused by the application of the perfluoride film layer in the deep ultraviolet optical thin film in the prior art.

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  • Low-loss deep-ultraviolet multilayer film production method

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Embodiment Construction

[0014] Such as figure 1 Shown, the preparation method of low-loss deep ultraviolet multilayer film of the present invention, this preparation method comprises the following steps:

[0015] Step 1. Ultrasonic cleaning, slow dehydration, and N 2 drying;

[0016] Step 2. According to the film system structure in the thin film design, on the optical substrate 1 after the completion of step 1, the oxide film layer stack 2 is prepared by ion-assisted electron beam evaporation process, so as to realize a denser and smoother inner side in the multilayer film system The film system can effectively reduce the scattering loss of the multi-layer film system;

[0017] Step 3. Due to the introduction of process gas in the ion-assisted electron beam evaporation process, the background vacuum degree of the coating chamber will be reduced. The thermal evaporation process needs to be deposited under a relatively high degree of vacuum, so it is necessary to wait for the vacuum degree of the c...

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Abstract

The invention relates to a low-loss deep-ultraviolet multilayer film production method, belongs to the application field of the deep-ultraviolet optical technology, and aims at solving the problems of the deep-ultraviolet optical film in the prior art that an optical film system is large in absorption loss by adopting a total oxide film layer and is large in scattering loss by adopting a total fluoride film layer. The low-loss deep-ultraviolet multilayer film production method includes the following steps: 1 an optical substrate needing film plating is subjected to ultrasonic cleaning, slow pulling and dewatering and N2 drying; 2 an oxide film layer stack is prepared on the optical substrate obtained in the step 1 by aid of the ion assisted electron beam evaporation technology according to a film system structure of the film design; and 3 a fluoride film layer stack is prepared on the oxide film layer stack by aid of the thermal evaporation process. The low-loss deep-ultraviolet multilayer film production method overcomes shortcomings of the loose interior structure and large surface roughness of films in a total fluoride multilayer film system and the shortcoming of large absorption loss of a total oxide multilayer film system caused by acting of middle-and-outer-layer oxide films and laser.

Description

technical field [0001] The invention relates to a preparation method of a low-loss deep ultraviolet multilayer film, belonging to the application field of deep ultraviolet optical technology. Background technique [0002] In recent years, deep ultraviolet optical applications represented by ArF excimer lasers and free electron lasers with wavelengths below 200nm have achieved considerable development. Laser industry applications including labels, excimer laser medical treatment, and scientific research have been widely used in many fields. The research on deep ultraviolet optical related technologies has great social and economic value. The continuous development of deep ultraviolet laser optical systems and applications poses new challenges to the performance and long-term stability requirements of deep ultraviolet optical thin film components. [0003] The 193nm lithography system is one of the most complex optical systems built by humans so far. As the 193nm lithography ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/10C23C14/06C23C14/24G02B1/18
Inventor 金春水靳京城李春邓文渊常艳贺
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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