Photosensitive composition, cured film formed therefrom, and element having cured film
A technology of photosensitive composition and cured film, applied in the direction of photosensitive materials, optics, and optomechanical equipment for optomechanical equipment, etc., can solve the problem of reduced electrode conductivity, insufficient heat resistance or chemical resistance, curing Film coloration, reduced transparency and other problems, to achieve the effect of high heat resistance, excellent heat and humidity resistance
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[0171] Examples are given below to describe the present invention more specifically, but the present invention is not limited by these Examples. In addition, among the compounds used, the abbreviated compounds are as follows.
[0172] DAA: diacetone alcohol
[0173] PGMEA: Propylene Glycol Monomethyl Ether Acetate
[0174] GBL: gamma-butyrolactone
[0175] EDM: diethylene glycol methyl ethyl ether
[0176] DPM: dipropylene glycol monomethyl ether.
[0177]In addition, the solid content concentration of the polysiloxane solution and the acrylic resin solution, and the weight average molecular weight (Mw) of the polysiloxane and the acrylic resin were obtained as follows.
[0178] (1) Solid content concentration
[0179] 1 g of the polysiloxane solution or the acrylic resin solution was weighed in an aluminum cup, and heated at 250° C. for 30 minutes using a hot plate to evaporate the liquid component. The solid content remaining in the heated aluminum cup was weighed to o...
Synthetic example 1
[0190] Synthesis example 1: Synthesis of polysiloxane solution (A1-a)
[0191] Add 81.72 g (0.60 mol) of methyltrimethoxysilane, 59.49 g (0.30 mol) of phenyltrimethoxysilane, (2-(3,4-epoxycyclohexyl) ethyl trimethyl Oxysilane 24.64g (0.10 mol), DAA163.1g, while stirring at room temperature, add the phosphoric acid aqueous solution that dissolves phosphoric acid 0.54g (0.3% by weight relative to the added monomer) in water 55.8g for 10 minutes. Then After immersing the flask in a 40°C oil bath and stirring for 30 minutes, the oil bath was heated to 115°C in 30 minutes. One hour after the start of the temperature rise, the internal temperature of the solution reached 100°C, and it was heated and stirred for 1.5 hours (within Temperature is 100~110 ℃), obtain polysiloxane solution (A1-a). It should be noted that, during heating and stirring, flow nitrogen at 0.05L (liter) / min. Methanol, water as by-products in the reaction A total of 131 g was distilled off.
[0192] The solid ...
Synthetic example 2
[0193] Synthesis Example 2: Synthesis of polysiloxane solution (A1-b)
[0194] Add 54.48 g (0.40 moles) of methyltrimethoxysilane, 99.15 g (0.50 moles) of phenyltrimethoxysilane, (2-(3,4-epoxycyclohexyl) ethyl trimethyl Oxysilane 24.64g (0.10 mol), DAA179.5g, while stirring at room temperature, add the phosphoric acid aqueous solution that dissolves phosphoric acid 0.54g (0.3% by weight relative to the added monomer) in water 55.8g for 10 minutes. Then After immersing the flask in a 40°C oil bath and stirring for 30 minutes, the oil bath was heated to 115°C in 30 minutes. One hour after the start of the temperature rise, the internal temperature of the solution reached 100°C, and thus heated and stirred for 2 hours (within Temperature is 100~110 ℃) to obtain polysiloxane solution (A1-b). It should be noted that, during heating and stirring, nitrogen gas was circulated at 0.05L (liter) / min. Methanol and water, which were by-products in the reaction, were A total of 121 g was d...
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