Vapor plating method for organic light-emitting diode

A light-emitting diode and vapor deposition technology, which is applied in vacuum evaporation coating, sputtering coating, ion implantation coating and other directions, can solve the problem of inability to reach the substrate, improve service life, avoid board surface deformation, and improve film formation. rate effect

Inactive Publication Date: 2013-07-17
KUN SHAN POWER STENCIL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] The technical problem to be solved by the present invention is that in the existing OLED manufacturing technology, the organic particles cannot reach the substrate due to the shielding of the opening wall during evaporation, and a new evaporation method for organic light-emitting diodes is provided, which has the advantages of The advantages of high utilization rate of organic materials, high film formation rate, long service life of mask plate and cost saving

Method used

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  • Vapor plating method for organic light-emitting diode
  • Vapor plating method for organic light-emitting diode
  • Vapor plating method for organic light-emitting diode

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] A 50 μm thick trench mask for evaporation, in the shape of a quadrilateral metal plate, including the ITO surface in contact with the indium tin oxide (ITO) surface and the evaporation surface, the mask has a through ITO Several grooves on the surface and the evaporation surface, the openings of the grooves on both surfaces are groove-shaped openings, and the groove-shaped openings are spaced from each other and parallel to each other; the opening area of ​​the groove-shaped openings on the ITO surface is smaller than that on the evaporation surface. The area of ​​the opening on the plated surface.

[0041] Invar alloy is selected as the mask material, and the etching process is used to form half-cut from the ITO surface of the mask, such as Figure 5 The long and narrow opening 02, the depth of the opening 02 is 15 μm, and the lateral dimension of the opening 02 is 70 μm; it is formed by etching from the evaporation surface 5 of the mask plate as Figure 5 The middle ...

Embodiment 2

[0045] A trench mask for evaporation, the transverse section is as figure 2 As shown, the thickness is 150 μm, and the shape is a quadrilateral metal plate, including the ITO surface 4 and the evaporation surface 5 that are in contact with the indium tin oxide (ITO) surface. The mask plate has a through ITO surface and the evaporation surface. The size of the opening 1 of the groove on the ITO surface is smaller than the size of the opening 2 on the evaporation surface. Invar alloy is selected as the mask material, and the double-sided etching process is adopted. image 3 It is a schematic diagram of the cooperation between the mask plate and the ITO surface.

[0046] 4 etch from the ITO side of the mask to form as figure 2 Opening 1 on the ITO surface of the middle mask, the depth of opening 1 is 45 μm, and the lateral dimension is 70 μm, etched from the evaporation surface 5 of the mask to form figure 2 Opening 2 on the evaporation surface, and ensure that the center o...

Embodiment 3

[0050] A trench mask plate for evaporation, with a thickness of 100 μm, shaped as a quadrilateral metal plate, including two surfaces of an ITO surface and an evaporation surface, the mask plate has a groove penetrating the ITO surface and the evaporation surface, and the groove The size of the openings on the ITO side is smaller than the size of the openings on the evaporation side.

[0051] The trench mask for evaporation is a quadrilateral nickel-cobalt alloy metal plate, the ITO surface opening depth of the mask is 25 μm, and the lateral dimension is 50 μm. The opening on the evaporation surface coincides with the center of the ITO surface opening of the template, and the evaporation The center of the opening on the surface is symmetrical, the depth is 75 μm, and the lateral dimension is 100 μm, and the opening hole wall on the evaporation surface has a certain concave curvature, forming an evaporation angle of 30°. By separately controlling the etching time of the ITO sur...

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Abstract

The invention relates to a vapor plating method for an organic light-emitting diode (OLED), and aims to mainly solve the technical problem that organic particles cannot reach a substrate due to shadowing of a mask plate aperture wall during vapor plating in the existing OLED manufacturing technologies. The invention employs a vapor plating method of OLED, and the method includes the steps of: combining the ITO (indium tin oxide) surface of a mask plate with an ITO semiconductor glass surface, making the vapor plating surface of the mask plate correspond to an organic vapor plating source; vaporizing an?organic material, and making the organic material attached to the ITO semiconductor glass surface through groove-shaped apertures on the mask plate; and separating the mask plate and the ITO semiconductor glass, thus completing vapor plating. Specifically, the vapor plating mask plate is a quadrilateral metal plate and includes the ITO surface in contact with an ITO and the vapor plating surface. The mask plate is equipped with groove-shaped apertures running through the ITO surface and the vapor plating surface, the size of the apertures on the ITO surface is smaller than that on the vapor plating surface. According to the technical scheme, the problem is well solved. Thus, the method can be used in the industrial production of organic light-emitting diodes.

Description

[0001] technical field [0002] The invention relates to an evaporation method for organic light-emitting diodes in the OLED manufacturing process. Background technique [0003] Generally, an OLED device is an emissive display device that emits light by electrically exciting a fluorescent organic compound. The OLED device can be regarded as a passive matrix OLED (PMOLED) device or an active matrix OLED (AMOLED) device according to a driving manner of N×M pixels that can be arranged in a matrix. Compared with PMOLED devices, AMOLED devices are suitable for large-sized displays due to their low power consumption and high resolution. [0004] Depending on the direction in which light is emitted from the organic compound, the OLED device can be a top-emitting OLED device, a bottom-emitting OLED device, or a top and bottom-emitting OLED device. Top-emitting OLED devices emit light in the opposite direction to the substrate on which the pixels are disposed and, unlike bottom-emi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04H01L51/56
Inventor 魏志凌高小平郑庆靓
Owner KUN SHAN POWER STENCIL
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